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InGaAsP as thin film layers - Chemical etching

Material Name: InGaAsP as thin film layers
Recipe No.: 7043
Primary Chemical Element in Material: In
Sample Type: Thin film
Uses: Etching
Etchant Name: None
Type (Macro/Micro): Micro
Etching Method: Wet (chemical) etching
Etchant (Electrolyte) Composition: x...x % Br2, x...MeOH. Note: The volume/quantity was not shown in the referenced article and is therefore designated as an "x".
Procedure (Condition): Temperature: RT.
Note: InGaAsP as thin film layers.
Reference: Perrin Walker, William H Tarn: Handbook of Metal Etchants, CRC Press, Boca Raton, Florida, USA, 1990, p. 678.