TEM Sample Preparation Procedures

TEM Sample Preparation Procedures

14CrMOV6-3 steel - Sample preparation
Al alloys as sheet, plate and rod - Electrolytic etching
Al evaporated on KCl - Al, evaporated on KCl, (100) and (111) cleaved substrates as oriented thin films
Al-Cu-Mg-Ag alloy - Foil preparation for TEM
AlN thin films (100) and (111)-Acid, float-off
All materials - EBSD sample preparation
Alloy Al69Nb20Ni11 - Twin jet polishing mehod
Alloy Co67Ta33 - Twin jet micro mehod
Alloy Fe47Ni44Al9 - Twin jet polishing mehod
Alloy Fe67Al24C6 - Twin jet polishing mehod
Alloy MA 6000 - Twin jet polishing mehod
Alloy Ni33Al33Cr34 - Twin jet polishing mehod
Alloy Ni50Al50 - Twin jet polishing mehod
Alloy Ni50Co18Al32 - Twin jet polishing mehod
Alloy Ni74Al25C1 - Twin jet polishing mehod
Alloy Ni76Al17Ti6 - Twin jet polishing mehod
Alloy Ni89Al11 - Twin jet polishing mehod
Alloy SRR99 - Twin jet polishing mehod
Alloy Ti42Si38 - Twin jet polishing mehod
Alloy Ti52Al48 - Twin jet polishing mehod
Alloy Ti52Al48 - Twin jet polishing mehod
Alloy Ti52Al48V1 - Twin jet polishing mehod
Alloy Ti83Co12Al5 - Twin jet polishing mehod
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 100Cr6 steel
Alloyed ferrite steels - Electrolytic polishing - 10CrMo9-10 steel
Alloyed ferrite steels - Electrolytic polishing - 20CrMoV4-10 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 26NiCrMo(V)14-6 steel
Alloyed ferrite steels - Electrolytic polishing - 8CrMoNiNb9-10 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X12CrMoS-17 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X17CrMoVNb-12-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X20CrMoWV12-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X22CrMoV12-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X40Cr6 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X40Cr6 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X40CrMoV5-1 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X7CrNiAl17-7 steel
Alloyed steels with up to 9% Ni - Electrolytic polishing - X8CrMoTi-17 steel
Alumina-silicon-phosphorous trioxide-Yttria glass - 49.2 mol.% Al2O3-38.8% SiO2-9.0% P2O3-9.0% Y2O3
Aluminium - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Aluminium alloys - Electrolytic polishing
Au as hard gold coatings on copper substrates - Metal plating
Au thin film deposited by CVD - Metal diffusion
Au thin films - Electrolytic polishing
Au thin films deposited on (0001) muscovite mica substrates - Acid, float-off
Au thin films deposited on (100) NaCl substrates - Acid, float-off
Au2Ga thin films - Ionized gas thinning
Austenitic steels, CrNi steels - Electrolytic polishing
Austenitic steels, CrNi steels, N-alloyed - Electrolytic polishing
Austenitic steels, CrNiMo steels - Electrolytic polishing - 17Cr, 17Ni, 4.5 Mo steels
Austenitic steels, CrNiMo steels - Electrolytic polishing - X120Mn12 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X2CrNiMoN18-4 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X2CrNiMoN20-15 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X2NiCoMo18-8-5 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X35Mn18 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X45CrMnN23-8 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X5CrNiMo18-10 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X6CrNi1-11 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X6CrNiMo17-13 steel
Austenitic steels, CrNiMo steels - Electrolytic polishing - X6CrNiMoN17-13 steel
BP (100) and (111) single crystals - Molten flux
CMSX-6 alloy - Electrolytic polishing
Cast irons - Electrolytic polishing - Cast irons with spher. graphite
Cd-Mg alloy - Mg3Cd - Thinning for TEM
CdTe thin film - Chemical float-off
Cobalt alloys - Electrolytic polishing
Copper - Electrolytic polishing
Copper alloys - Electrolytic polishing
Corning glass #7059 - Acid, float-off
Cu thin films evaporated on NaCl - Acid, float-off
CuInTe2 thin films - Acid, float-off
Electrolytes for TEM preparation od intermetallics
ErH2 and ErH3 - Acid, float-off
Etchants for Inconel-X alloy
Extraction replica etchant for Cu alloys - Chemical etching
Extraction replica etchant for high chromium and alloy steels - Chemical etching
Extraction replica etchant for high speed steels - Chemical etching
Extraction replica etchant for mild and low alloy steels - Chemical etching
Extraction replica etchant for nickel alloys - Chemical etching
Extraction replica etchant for stainless steels - Chemical etching
Extraction replica etchant for titanium alloys - Chemical etching
Fe, low-carbon steels, low-alloy steels - Chemical polishing
Fe-B-Si alloy - Electrolytic thinning for TEM
Fe-Co alloys - Electrolytic polishing
Fe-Co-Si alloys - Electrolytic polishing
Fe-Mo-Al alloys - Electrolytic polishing
Fe-Ni alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
Fe-Si alloys - Electrolytic polishing
GX6CrNi13-4 steel - Sample preparation
GaAs (100) Te-doped wafer - Chemical cleaning
GaAs (100) n-type, 0.001-0.04 Ohm cm resistivity wafers - Chemical thinning
GaAs (100) wafer substrates - Chemical thinning
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Chemical etching
GaAs (100) wafers - Physical thinning
GaAs (100) wafers as substrates - Chemical etching
GaAs (100), and InP, (100) wafers - Chemical thinning
Ge and InP (100) and (111) wafers - Chemical thinning
Hafnium - Thinning for transmission electron microscopy (TEM)
Hardmetals - Electrolytic polishing
High speed steels - Electrolytic polishing
High temperature CrMoN steels - Electrolytic polishing
High temperature CrMoN steels - Electrolytic polishing
IN 738 alloy - Sample preparation
InGaSb deposited as a thin film on BaF2 substrate (111) - Chemical thinning
InP (100) n-type wafers - Chemical etching
InP (100) wafers - Chemical etching
InP (100) wafers used for zinc deposition and anneal - Chemical thinning
KCl (111) and (100) cleaved wafers - Chemical cleaning
KI (100) wafers - Chemical etching
Mar M247 - Electrolytic polishing
MgO (100) substrates - Acid, float-off
MgO (100) wafers - Chemical thinning
MgO sample prepration
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Microalloyed steels - Electrolytic polishing
Molybdenum - Electrolytic polishing
Muscovite mica (0H)2KAl2(AlSi3O10) - Acid, float-off
NaCl (100) cleaved wafers - Chemical polishing
NaCl (100) wafers - Chemical polishing
NaCl (100) wafers - Acid, float-off
Ni50Al46Nb4 or Ni40Al39Nb21 alloys - Twin jet polishing mehod
Nickel - Electrolytic polishing
Nickel alloys - Electrolytic polishing
Nicrofer alloy - Electrolytic polishing
PbSe (100) wafers - Eelectrolytic polishing/thinning
PbTe thin film - Acid float-off
Pt thin film - Acid, float-off
Pure Molybdenum - EBSD sample preparation
Pure iron - Electrolytic polishing
Pure iron, nitrided with less than 0.015% C - Electrolytic polishing
Pure iron, nitrided with less than 0.015% C - Electrolytic polishing
Pure iron, nitrided with less than 0.015% C - Electrolytic polishing
Pyrex blanks - Acid float-off
Rubber-reinforced plastics - Chemical etching
Se thin films - Acid, float-off
Si (100) and (111) wafers - Acid, float-off
Si (100) and (111) wafers both n- and p-type - Chemical thinning
Si (100) wafers - Chemical cleaning
Si (100) wafers - Chemical jet thinning
Si (100) wafers - Chemical thinning
Si (100) wafers, p-type, 2 Ohm cm resistivity - Chemical thinning
Si (111) wafers, p-type, 7-21 Ohm cm resistivity - Chemical jet thinning
Si (111), (100) and (110) wafers, n-type 0.1-0.7 Ohm cm and p-type 0.4-3 Ohm cm resistivity - Ionized gas thinning
Si wafers of various orientations - Ionized gas etching
SiO2 thin film deposits on silicon wafer - Chemical etching
SiV2 thin films - Chemical etching/polishing
Silicon carbide (SiC) - Etching of SiC for Transmission Electron Microscopy (TEM)
Silicon single crystals - Etching of the p-n transition
Silicon single crystals - For TEM sample preparation
Silicon single crystals - For TEM sample preparation
Silicon single crystals - For revealing dislocations
Sn (001) and (111)-tetragonal alpha-tin single crystals - Electrolytic polishing
SnTe thin films grown on muscovite mica (0001) substrates - Acid, float-off
Steel specimens - TEM sample preparation
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium - Electrolytic polishing
Titanium alloys - Electrolytic polishing
Titanium alloys - Electrolytic polishing
Tungsten alloys - Electrolytic polishing
Tungsten alloys - Electrolytic polishing
Unalloyed steels - Electrolytic polishing
Unalloyed steels - Electrolytic polishing
Unalloyed steels - Electrolytic polishing
Unalloyed steels - Electrolytic polishing
Waspaloy - Twin jet polishing mehod
White's etchant - Si (111) wafers, n- and p-type - Chemical thinning
Zinc - Electrolytic polishing
ZnTe thin films - Acid, float-off
Zr poly sheet - Chemical thinning
Zr poly sheet - Chemical thinning
a-Ge as thin film material deposited on NaCl (100) substrates - Float-off
a-Ge thin film grown on NaCl-Acid, float-off
a-Ge thin films deposited on NaCl - Acid, float-off