Etchants for Chromium and Alloys

Etchants for Chromium and Alloys

ASTM etchant No. 12 - Aqua Regia - For chromium base alloys
ASTM etchant No. 12 - Chromium - Chemical etching
ASTM etchant No. 13 - Oxalic acid - For Cr base alloys
ASTM etchant No. 13c - Chromium - Electrolytic etching
Agua Regia - Cr and Cr alloys - Chemical etching
Aqua Regia - Chromium - Chemical etching
Ceramic Cr-SiO2 (30%) - Chemical etching
Ceramic Cr-SiO2 (30%) - Chemical etching
Chrome etchant - Cr thin films - Chemical etching
Chrome etchant - Cr2O3 amorphous thin films - Chemical etching
Chrome etchant - For Cr thin films
Chrome etchants, modified - Cr thin film deposits on glass substrates
Chromium - Chemical-Mechanical polishing
Chromium - Cr and Cr alloys
Chromium - Cr and Cr base alloys, Fe-Cr alloys and V
Chromium - Cr, Mo, Mo-Cr alloys (up to 80% Cr)
Chromium - Cr, Nb, and alloys
Chromium - Electrolytic etching
Chromium - Electrolytic etching
Chromium - Electrolytic and chemical etching
Chromium - Electrolytic etching
Chromium - Electrolytic etching
Chromium - Electrolytic etching and electrolytic thinning
Chromium - Electrolytic mechanical polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic thinning for electron microscopy
Chromium - Physical etching
Chromium - Physical etching
Chromium - Produces etch pits on surface near to (111)
Chromium - Ta, Nb, and their alloys, Cr and Cr silicide. Re silicide, W-Th alloys
Chromium - Attack polishing
Chromium - Attack polishing
Chromium - Chemical etching - General macrostructure
Chromium - Chemical etching - General macrostructure
Chromium - Chemical etching
Chromium - Cr and Cr base alloys
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - Electrolytic polishing
Chromium - General macrostructure
Chromium - Good general-purpose elctrolyte
Chromium and chromium alloys - Electrolytic polishing
Chromium and chromium alloys - Electrolytic polishing
Chromium and chromium alloys - Electrolytic polishing
Chromium and its alloys - Electrolytic polishing
Chromium boride (CrB2) - Chemical etching
Chromium films - Chemical etching
Chromium films - Physical etching
Chromium oxide (Cr2O3) - Chemical etching
Chromium plating
Chromium silicide - Chemical etching
Chromium-Copper (Cr-Cu) - Electric contact material
Cr alloys - Chemical etching - General macrostructure
Cr and Cr alloys - Chemical etching
Cr and Cr alloys - Chemical etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys - Electrolytic etching
Cr and Cr alloys, C-Fe alloys, Mo (grain-contrast etchant), Re and Re-base alloys, V and V-base alloys - Electrolytic etching
Cr as evaporated deposits in vacuum systems - Chemical cleaning
Cr as evaporated deposits in vacuum systems - Chemical cleaning
Cr evaporated thin films - Chemical etching
Cr evaporation deposits - Chemical etching
Cr plating - General macrostructure
Cr specimens - Chemical etching
Cr thin films - Chemical etching
Cr thin films - Gas oxidation
Cr thin films - Physical etching
Cr, Mo, Nb, Ta, V, W and their alloys - Chemical-Mechanical polishing
Cr-Alumina alloy (Al2O3) - 70% Cr-30% Al2O3
Cr-Fe alloy - Electrolytic thinning
Cr-Fe alloy - Fe-24/25Cr - Electrolytic thinning
Cr-Hf carbide - 0.5 mol % HfC
Cr-Ir alloys - Chemical etching
Cr-Mo alloys (Mo-rich) - Chemical etching
Cr-Mo steel - Electrolytic etching
Cr-N system (Cr-rich) - Chemical etching
Cr-Nb alloys - Chemical etching
Cr-Nb carbide - 0.5 mol % NbC
Cr-Nb-Zr-C alloy - 0.7% Zr, 1.0% Nb, 0.04% C
Cr-Re alloy - Thinning for electron microscopy
Cr-Rh system - Electrolytic etching
Cr-Ru alloys - Electrolytic etching
Cr-Sc alloy - May be examined unetched
Cr-Si alloys (2-76 wt.% Si) - Attack polishing
Cr-Si system - For alloys with up to 40 at.% S and over
Cr-Ta boride - Chemical etching
Cr-Ta carbide - 0.5 mol % TaC
Cr-Ti carbide - 0.5 mol % TiC
Cr-Ti carbide - Chemical etching
Cr-W - Attack polishing
Cr-W alloy - Alloys with 29-40 at.% W
Cr-Y alloy - May be examined unetched
Cr-Zr carbide - Chemical etching
Cr-Zr carbide -0.5 mol % ZrC
Cr-Zr-C alloys - Electrolytic etching
Cr2O3 (0001) and (1011) wafers- Chemical etching
Cr2O3 (0001) wafers- Chemical etching
Cr2O3 (111) single crystal - Material growth
Cr2O3 thin film - Chemical etching
Cr3B2 specimens - Chemical etching
Cr3B2 specimens - Chemical etching
Cr3B2 specimens - Chemical etching
CrB2 specimens - Chemical etching
CrSi2 thin films deposited on silicon substrates - Gas oxidation
Fluor regia etchant - Cr and Cr alloy - Chemical etching
Glyceregia - Cr and Cr alloys - Chemical etching
High Cr containing alloys, Cr silicide, galvanic Cr layers, Mo-Cr-Fe alloys, U-Nb alloys, V and V-base alloys, ferrovanadium - Electrolytic etching
Kodak's EB-5 etchant - Cr thin films - Chemical etching
Murakami's etchant - Cr and Cr alloys - Chemical etching
P2Cr5 thin film - Chemical etching