Polishing

Polishing

(Y2O3)m(ZrO2)(1-m) (100) Wafers - Chemical Polishing
79Ni-17Fe-44Mo (111) Oriented Permalloy Wafers - Electrolytic Polishing
79Ni-17Fe-4Mo Permalloy Single Crystal Specimens - Chemical Polishing
A1203 - Polishing
Ag (001) Wafers - Chemical Polishing
Ag (111) and (100) Wafers - Chemical Polishing
Ag - Polishing
Ag - Polishing
Ag - Polishing
Ag Single Crystal Specimens - Electrolytic Polishing
Ag-Sn (1%) Single Crystal Alloys - Electrolytic Polishing
Ag2Al Single Crystal Specimens - Electrolytic Polishing
Ag2Al Single Crystal Sphere - Chemical Polishing
Ag2Se (100) Wafers - Chemical Polishing
Ag2Se (100) Wafers and Other Orientations - Chemical Polishing
Ag2Se (100) Wafers and Other Orientations - Chemical Polishing
Ag2Te (100) Wafers - Chemical Polishing
AgBr (110) Wafers - Abrasive Polishing
AgCl (100) Wafers - Chemical Polishing
AgFeTe2 Single Crystal Specimens - Chemical Polishing
AgS Single Crystal Whiskers - Electrolytic Polishing
AgSbTe2 Single Crystal Specimens - Chemical Polishing
AgTiSe Single Crystal Material - Chemical Polishing
Agua Regia - Ti0.3W0.7Si2 Thin Films - Chemical Polishing
Al (001) Wafers - Al (001) Wafers and Other Orientations
Al (001) Wafers - Al, (001) Wafers Used in a Study of Lithium Precipitation Along Dislocations
Al (100) Wafers Used in an Oxidation Study - Electrolytic Polishing
Al - Polishing
Al Single Crystal Specimens - Electrolytic Polishing
Al Single Crystal Specimens - Electrolytic Polishing
Al Single Crystal Specimens - Electrolytic Polishing
Al-Cu-Mg-Ag Alloy - Foil Preparation for TEM
Al-Tm Alloys - Electrolytic Polishing
Al-Zr Alloy - For Alloy with 0.8% Zr - Al-Zr Alloy
Al203 - Polishing
AlAs Thin Films - Chemical Polishing
AlGaAs (111)A - Wet Etching
AlGaAs - Wafer Polishing
AlP Single Crystal Wafer - Chemical Polishing
AlSb Wafers - Chemical Polishing
AlSb Wafers - Chemical Polishing
AlSb Wafers - Chemical Polishing
Allen's Etchant - InSb (111) Wafers - Chemical Polishing
Alloy Co67Ta33 - Twin Jet Micro Method
Alloy Fe47Ni44Al9 - Twin Jet Polishing Mehod
Alloy Fe67Al24C6 - Twin Jet Polishing Mehod
Alloy MA 6000 - Twin Jet Polishing Mehod
Alloy Ni33Al33Cr34 - Twin Jet Polishing Mehod
Alloy Ni50Al50 - Twin Jet Polishing Mehod
Alloy Ni74Al25C1 - Twin Jet Polishing Mehod
Alloy NiAl - Electrolytic Polishing
Alloy Ti42Si38 - Twin Jet Polishing Mehod
Alloy Ti52Al48 - Twin Jet Polishing Mehod
Alloy Ti52Al48 - Twin Jet Polishing Mehod
Alloy Ti52Al48V1 - Twin Jet Polishing Mehod
Alloy Ti83Co12Al5 - Twin Jet Polishing Mehod
Alloyed Ferrite Steels - Electrolytic Polishing - 26NiCrMo(V)14-6 Steel
Alloyed Ferrite Steels - Electrolytic Polishing - 100Cr6 steel
Alloyed Ferrite Steels - Electrolytic Polishing - 10CrMo9-10 Steel
Alloyed Ferrite Steels - Electrolytic Polishing - 20CrMoV4-10 Steel
Alloyed Ferrite Steels - Electrolytic Polishing - 26NiCrMo(V)14-6 Steel
Alloyed Ferrite Steels - Electrolytic Polishing - 26NiCrMo(V)14-6 Steel
Alloyed Ferrite Steels - Electrolytic Polishing - 26NiCrMo(V)14-6 Steel
Alloyed Ferrite Steels - Electrolytic Polishing - 8CrMoNiNb9-10 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X12CrMoS-17 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X17CrMoVNb-12-1 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X22CrMoV12-1 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X40Cr6 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X40Cr6 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X40CrMoV5-1 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X7CrNiAl17-7 Steel
Alloyed Steels with up to 9% Ni - Electrolytic Polishing - X8CrMoTi-17 Steel
Alpha-HgI2 Single Crystal Specimens - Chemical Polishing
Alpha-HgI2 Single Crystal Specimens - Chemical Polishing
Alpha-LiIO3 - Polishing
Alpha-LiIO3 - Polishing
Alpha-SiC (0001) Wafers - Gas Polishing
Alpha-Ti - Polishing
Aluminium - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Alloys - Electrolytic Polishing
Aluminium Single Crystal - Electrolytic Polishing
Aluminium Single Crystal - Electrolytic Polishing
Aluminium Single Crystal Specimens - Chemical Polishing
Aluminium Single Crystal Specimens - Chemical Polishing
Aluminium and Aluminium Alloys - Electrolytic Polishing
As (0001) Cleaved Specimens - Chemical Polishing
Au Thin Films - Electrolytic Polishing
Au as Single Crystal Blanks - Abrasive Polishing
Au-Cr Alloys - Jet Electrolytic Polishing
Au-Cu Alloy - Electrolytic Polishing
Austenitic Steels, CrNi Steels - Electrolytic Polishing
Austenitic Steels, CrNi Steels, N-alloyed - Electrolytic Polishing
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - 17Cr, 17Ni, 4.5 Mo Steels
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X120Mn12 Steel
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X2CrNiMoN18-4 Steel
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X2NiCoMo18-8-5 Steel
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X35Mn18 Steel
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X45CrMnN23-8 Steel
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X6CrNi1-11 Steel
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X6CrNiMo17-13 Steel
Austenitic Steels, CrNiMo Steels - Electrolytic Polishing - X6CrNiMoN17-13 Steel
Austenitic steels, CrNiMo Steels - Electrolytic Polishing - X2CrNiMoN20-15 Steel
BJ Etchant - Ge (111) Wafers - Chemical Polishing
BRM Etchant - GaP (111) and GaAs (111) Wafers - Chemical Polishing
BRM Etchant - InP (100) n-Type Wafers - Chemical Polishing
BRM Etchant - WS2 Single Crystal Specimens - Chemical Polishing
BRM Etchant - WSe2 Single Crystal Specimens - Chemical Polishing
Ba2TiO3 Specimens - Chemical Polishing
BaF2 (111) Wafers - Chemical Polishing
BaF2 (111) Wafers - Chemical Polishing
BaWO4 Single Crystal - Chemical Polishing
Be (001), (100), and (110) Wafers - Electrolytic Polishing
Be Single Crystal - Electrolytic Polishing
Beryllium - Jet Electrolytic Polishing
Bi (0001) Wafers - Chemical Polishing
Bi2Se3 (0001) Wafers - Chemical Polishing
Bi2Se3 Single Crystal Ingot - Chemical Polishing
Bismuth - Electrolytic Polishing
Bismuth-Single Crystal - Electrolytic Polishing
Br2:Methanol - GaAs - Wet Etchant by Chemical Composition
Br2:Methanol - GaAs - Wet Etchant by Chemical Composition
Br2:Methanol - InP - Wet Etchant by Chemical Composition
Br2:Methanol - InP - Wet Etchant by Chemical Composition
Br2:Methanol - InP - Wet Etchant by Chemical Composition
Brass, as Single Crystal Alpha-Brass - Electrolytic Polishing
CP4, Variety CP4A Etchant - InSb (111) Wafers and Other Orientation - Chemical Polishing
CP4A Etchant - Si (111) Wafers and Other Orientations - Chemical Polishing
Ca5(PO4)3F - Wet Chemical Polishing
CaW04 - Polishing
CaW04 Single Crystal Specimens - Chemical Polishing
CaWO4 Single Crystal Specimens - Chemical Polishing
Cadmium Single Crystal - Chemical Polishing
Cadmium Single Crystal - Chemical Polishing
Cadmium Single Crystal - Chemical-Mechanical Polishing
Cadmium Telluride (CdTe) Single Crystal - Chemical Polishing
Caro's Etchant, Modified - Si (111) Wafers Used in a Study of Ion Bombardment Cleaning - Chemical Polishing
Cast Irons - Electrolytic Polishing
Cd (111) and (100) Single Crystal Wafers - Chemical Polishing
Cd3As2 - Polishing
Cd3As2 Single Crystal Specimen - Chemical Polishing
CdI2 (0001) Wafers - Chemical Polishing
CdIn2Se4 Single Crystal Specimens - Chemical Polishing
CdIn2Te4 Wafers - Chemical Polishing
CdS (0001) Wafer - Chemical/Mechanical Polishing
CdS (100) Wafer - Chemical Polishing
CdS (111) Wafers - Chemical Polishing
CdS (111) Wafers - Chemical Polishing
CdSb (100) Wafer - Chemical Polishing
CdSe Polycrystalline Thin Film - Chemical Polishing
CdTe (100) Wafers - Chemical Polishing
CdTe (111) Wafers - Chemical Polishing
CdTe (111) Wafers - Chemical Polishing
CdTe (111) Wafers - Chemical Polishing
CdTe (111) Wafers - Chemical Polishing
CdTe (111) Wafers - Chemical Polishing
CdTe (111) Wafers - Chemical Polishing
CdTe (111) Wafers - Chemical Polishing
CdTe (111) n-Type Wafers - Chemical Polishing
CdTe - Polishing
CdTe - Polishing
CdZnTe (or CZT) Wafers - Polishing
Chromium and its Alloys - Electrolytic Polishing
Co (0001) Wafers - Electrolytic Polishing
Co (0001) Wafers - Electrolytic Polishing
Cobalt Alloys - Electrolytic Polishing
Cobalt Single Crystal - Chemical Polishing
Cobalt and Cobalt Alloys - Electrolytic Polishing
Cobalt and Cobalt Alloys - Electrolytic Polishing
Cobalt and Cobalt Alloys - Electrolytic Polishing
Cobalt and Cobalt Alloys - Electrolytic Polishing
Copper - Chemical Polishing
Copper - Electrolytic Polishing
Copper Alloys - Electrolytic Polishing
Copper Single Crystal - Electrolytic Polishing
Copper Single Crystals - Electrolytic Polishing
Copper and Copper Alloys - Electrolytic Polishing
CsI - Polishing
Cu (100) Wafers - Chemical Polishing
Cu (111) Wafers - Electrolytic Polishing
Cu Oxides-Single Crystals - Chemical Polishing
Cu Single Crystal Specimens - Chemical Polishing
Cu Single Crystal Specimens - Chemical Polishing
Cu Single Crystal Specimens - Chemical Polishing
Cu Single Crystal Specimens - Electrolytic Polishing
Cu Single Crystal Specimens - Electrolytic Polishing
Cu Single Crystal Specimens - Electrolytic Polishing
Cu Single Crystal Spheres - Electrolytic Polishing
Cu Single Crystal Spheres - Electrolytic Polishing
Cu-Au single Crystal (Cu3Au) - Electrolytic polishing
Cu-Fe Single Crystal - Up to 1.58 wt.% Fe
Cu-In-Se (CuInSe2) - Chemical Polishing
Cu-In-Se (CuInSe2) - Chemical Polishing
Cu-Ti alloys - For Alloys with 1-4% Ti
Cu-Zn-Al Alloy - Electrolytic Thinning and Polishing
Cu-Zn-Be Alloys - Cu-20/30% Zn-0.11% Be - Chemical Thinning and Electrolytic Polishing
Cu3Au Single Crystal Specimens - Electrolytic Polishing
Cu3Au Single Crystal Specimens - Electrolytic Polishing
CuBr Single Crystals - Chemical Polishing
CuCl Single Crystals - Chemical Polishing
CuI Single Crystals - Chemical Polishing
CuInS2 Wafer - Chemical Polishing
CuInS2 n-Type Wafers - Chemical Polishing
CuInS2 n-Type Wafers - Photo Etch-Polishing
CuInSe2 Single Crystal - Chemical Polishing/Staining
Electrolytic Polishing NiTi Alloys
Example of Possible Application of the Back-Grinding and CMP Polishing Processes in Thinning of 150- or 200-mm Diameter Thick-Film SOI Wafers
Fe 3% Si Steel - Electrolytic Polishing
Fe Polycrystalline Discs - Electrolytic Polishing
Fe Thin Films Deposited by MBE on GaAs, (110) Wafer - Polishing
Fe, Fe-Si (Si 0.5-0.9 wt%) - Polishing
Fe-Co Alloys - Electrolytic Polishing
Fe-Co-Si Alloys - Electrolytic Polishing
Fe-Mo-Al Alloys - Electrolytic Polishing
Fe-Ni Alloys - Electrolytic Polishing
Fe-Ni-C Alloy - Alloy with 31% Ni and 0.3% C
Fe-Ni-Cr Alloy - Fe-15Ni-15Cr-Single Crystal - Electrolytic Polishing
Fe-Si (3%) Single Crystal Specimens - Electrolytic Polishing
Fe-Si Alloys - Electrolytic Polishing
Fe-Si Alloys - Electrolytic Polishing
Fe-Si Alloys - Electrolytic Polishing
Fe-Si Alloys - Electrolytic Polishing
Fe-Si Alloys - Electrolytic Polishing
Fe3O4 Specimen - Chemical Polishing
FeS2 Single Crystal Ingot - Chemical Polishing
Ga-As-P Alloy (GaAsP) - Chemical Polishing and Wet Etching
Ga-In-As Phosphide - Chemical Polishing
Ga-In-As Phosphide - Chemical Polishing
Ga-In-As Phosphide - Chemical Polishing
GaAs (100) Wafers - Chemical Polishing
GaAs (100) Wafers - Chemical Polishing
GaAs (100) Wafers - Chemical Polishing
GaAs (100) Wafers - Chemical Polishing
GaAs (100) Wafers - Chemical Polishing
GaAs (100) Wafers Cut within 2-3? of Plane - Chemical Polishing
GaAs (100) Wafers Fabricated as Diodes - Electrolytic Polishing
GaAs (100) Wafers Used for Zinc Diffusion at 850 C - Chemical Polishing
GaAs (100) Wafers Used in a Study of Zinc Diffusion - Chemical Polishing
GaAs (100) Wafers Used in a Study of Zinc Diffusion at 850 C - Chemical Polishing
GaAs (100) Wafers Used to Fabricate Schottky Barrier Diodes - Chemical Polishing
GaAs (100) n-Type Wafers - Chemical Polishing
GaAs (110), (111), (100) Wafers - Chemical Polishing
GaAs (111) Wafers - Chemical Polishing
GaAs (111) Wafers - Chemical Polishing
GaAs (111) Wafers - Chemical Polishing
GaAs (111) Wafers - Chemical Polishing
GaAs (111) Wafers - Chemical Polishing
GaAs (111) Wafers Fabricated as Esaki Diodes - Chemical Polishing
GaAs (111) Wafers and Spheres - Chemical Polishing
GaAs (111) Wafers with (111) Ga Surface Polished - Chemical Polishing
GaAs (111) and (100) Wafers - Chemical Polishing
GaAs (111) and (100) Wafers - Chemical Polishing
GaAs (111) n-Type and Undoped Material - Chemical Polishing
GaAs (111), n-Type, 5-30 Ohm cm Resistivity Wafers - Chemical Polishing
GaAs (111)A and (TTT)B Wafers - Chemical Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs - Wafer Polishing
GaAs Wafers - Chemical Polishing
GaAs Wafers - Chemical Polishing
GaAs Wafers of Various Orientations - Chemical Polishing
GaAs and GaP (100) and (111)B High n-Type Wafers - Chemical Polishing
GaAs:Cr (100) (SI) Wafers - Chemical Polishing
GaAs:Cr (100) (SI) Wafers - Chemical Polishing
GaAs:Cr (100) (SI) Wafers - Chemical Polishing
GaAs:Cr (100) (SI) Wafers - Wet etching - Polishing
GaAs:Cr, (100) (SI) Wafers - Halogen, Polish
GaAs; Zn, (100) Wafers Cut 2-3?-off Plane Toward (110) - Chemical Polishing
GaN - Wafer Polishing
GaP (100) and (111) Wafers - Chemical Polishing
GaP (100) and (111) Wafers - Gas Polishing
GaP (100) and (111)B, p-Type, 0.2 Ohm cm Resistivity Wafers - Chemical Polishing
GaP (100) n-Type Wafers - Chemical Polishing
GaP (100), (111)A and (111)B Wafers - Chemical Polishing
GaP (110) Undoped Wafers - Chemical Polishing
GaP (111) Wafer - Chemical Polishing
GaP (111) and (100) Wafers - Chemical Polishing
GaP (111) and GaAs (111) Wafers - Chemical Polishing
GaP (111) and GaAs (111)A Wafers - Chemical Polishing
GaP (111), (100), (110) Wafers - Chemical Polishing
GaP - Polishing
GaP - Wet Etching
GaP, GaAs - Chemical Polishing
GaS (100), n-Type Wafers - Chemical Polishing
GaSb (100) Undoped Wafers - Chemical Polishing
GaSb (100) Undoped Wafers - Chemical Polishing
GaSb (100) Undoped Wafers - Chemical Polishing
GaSb (100) Undoped Wafers - Chemical Polishing
GaSb (100) Undoped and Te-Doped Wafers - Chemical Polishing
GaSb (100) Wafers - Chemical Polishing
GaSb (111) and (100) Wafers - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gallium Arsenide (GaAs) - Chemical and Electrolytic Polishing
Gallium Arsenide (GaAs) - Chemical Polishing
Gd3Ga5O12 (110) Wafers - Abrasive Polishing
Gd3Ga5O12 (111) Wafers - Abrasive Polishing
Gd3Ga5O12 - Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers p-Type - Chemical Polishing
Ge (111) Wafers, p-Type, 4 Ohm cm Resistivity - Chemical Polishing
Ge (111) and (100) Wafers Used as Substrates - Chemical Polishing
Ge (111) n-Type, 0.004-40 Ohm cm Resistivity Wafers - Electrolytic Polishing
Ge (111), (100), and (110) Wafers - Chemical Polishing
Ge (111), p- and n-Type Wafers - Electrolytic Polishing
Ge - Chemical Polishing
Ge - Chemical Polishing
Ge - Chemical Polishing
Ge - Polishing
Ge Spheres of Single Crystal Germanium and Silicon - Chemical Polishing
Ge Wafers - Chemical Polishing
Ge Wafers Doped with Copper - Chemical Polishing
Ge Wafers Used as Substrates - Chemical Polishing
Ge and Si Wafers - Chemical Polishing
Ge as Single Crystal Spheres - Chemical Polishing
Ge n-Type Wafers - Chemical Polishing
GeTe - Polishing
Germanium - Jet Thinning by Chemical Polishing
Gold Single Crystal - Electrolytic Polishing
HCl:NaOCl - GaP - Wet Etchant by Chemical Composition
Hafnium Single Crystal - Chemical Polishing
Hardmetals - Electrolytic Polishing
Hg(1-x)Cd(x)Te Single Crystal - Chemical Polishing
HgCdTe (111) Wafers - Chemical Polishing
HgCdTe (111) Wafers and Other Orientations - Chemical Polishing
HgCdTe Single Crystal Wafers - Chemical Polishing
HgSe (111) Wafers - Chemical Polishing
HgSe Single Crystal Specimens - Chemical Polishing
HgTe Single Crystal Wafers - Chemical Polishing
High Alloy Steels - Electrolytic Polishing
High Speed Steels - Electrolytic Polishing
High Temperature CrMoN Steels - Electrolytic Polishing
High Temperature CrMoN Steels - Electrolytic Polishing
In2Te3 Specimens - Chemical Polishing
In2Tl3 Single Crystal Ingots - Chemical Polishing
In5Bi3 Single Crystal Specimens - Chemical Polishing
InAs (100) n-Type Wafers - Chemical Polishing
InP (100) Wafer Fabricated as Schottky Diodes - Chemical Polishing
InP (100) Wafers - Chemical Polishing
InP (100) Wafers - Chemical Polishing
InP (100) Wafers - Chemical Polishing
InP (100) Wafers Cut 3 deg.-off Toward (110) - Chemical Polishing
InP (100) Wafers Cut within 1 deg. of Plane - Chemical Polishing
InP (100) n-Type Wafers - Chemical Polishing
InP (110) Wafer Cleaved Under UHV - Chemical Polishing
InP (111) Wafers - Chemical Polishing
InP (111) Wafers Grown by LEC - Chemical Polishing
InP - Polishing
InP - Polishing
InP - Polishing
InP - Wafer Polishing
InP - Wafer Polishing
InP p-Type Single Crystal Wafers - Chemical Polishing
InP:Fe (100) (SI) Wafers - Chemical Polishing
InS (100) and (110) Wafers - Chemical Polishing
InSb (100) Wafers - Chemical Polishing
InSb (100) Wafers - Chemical Polishing
InSb (100) Wafers - Chemical Polishing
InSb (100) Wafers - Chemical Polishing
InSb (100) Wafers and Other Orientations - Chemical Polishing
InSb (110) n-Type and (100) p-Type Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Chemical Polishing
InSb (111) Wafers - Wet etching - Polishing
InSb (111) p-Type Wafers - Chemical Polishing
InSb (311) Wafers - Chemical Polishing
InSb (311) and (110) Wafers - Electrolytic Polishing
InSb - Polishing
InSb Thin Films - Chemical Polishing
Indium Single Crystal - Chemical Etching and Polishing
Iron Specimen - Chemical Polishing
Iron Specimen - Chemical Polishing
Iron Specimen - Chemical Polishing
Iron Specimen - Chemical Polishing in Hot Etchant
Iron Specimen - Electrolytic Polishing
Iron and Iron Alloys - Electrolytic Polishing
K2Cr2O7 (KBC) - Polishing
KBr (100) Wafers and Single Crystals - Water Polishing
KBr - Polishing
KBr and KI Single Crystal Specimens - Solvent Polishing
KCl (100) Cleaved Wafers - Chemical Polishing
KCl - Polishing
KCl - Polishing
KI (100) Wafers - Alcohol Polishing
KI and KBr Single Crystal Specimens - Polishing
KTaO3 Iron Doped Single Crystal Wafer - Abrasive Polishing
Kalling's Etchant - Y2(CoM)17 Single Crystal Ingots - Chemical Polishing
LaB6 Single Crystal Filaments - Electrolytic Polishing
LaBr3 (100) Wafers - Chemical Polishing
LaSrCoO3 Single Crystals Cleaved (001) - Salt Polishing
Lead Single Crystal - Chemical Polishing
Lenoir's Etchant, Modified - Cu-Al-Mn Alloy - Alloys with 3-4% Cu, 0.5 Mn
Lenoir's Solution, Modified - Al-Cu Alloy - Alloys with 1-5% Cu
Lenoir's Solution, Modified - Al-Cu-Mg Alloy - Alloys with 1-5% Cu, 0.5-1.5% Mg
Li3Bi Single Crystal Ingots - Chemical Polishing
LiF - Polishing
LiF - Polishing
LiF - Polishing
Lithium Fluoride (LiF) - Chemical Polishing
Lithium Fluoride (LiF) - Chemical Polishing
Lithium Fluoride (LiF) - Chemical Polishing
Lithium Fluoride (LiF) - Chemical Polishing
Low Alloy Steels - Chemical Thinning, Electrolytic Polishing
Magnesia (MgO) Single Crystal - Chemical Polishing
Magnesium Fluoride MgF2 - Chemical Polishing
Marshall's Solution - Fe Specimens - Chemical Polishing
Mg Single Crystal Wafers - Electrolytic Polishing
Mg2G3 (111) Wafers - Chemical Polishing
Mg2Ge (111) Wafers - Chemical Polishing
MgAl2O4 (Spinel) (100) and (111) Wafers - Chemical Polishing
MgO (100) Wafers - Chemical Polishing
MgO - Polishing
MgO - Polishing
MgSe Single Crystal - Chemical Polishing
Microalloyed Steels - Electrolytic Polishing
Mn(x)Zn(1-x)Y(z)O12 Single Crystal Specimens - Abrasive Polishing
MnTe2 Single Crystal Specimens - Chemical Polishing
Mo (100) Specimens - Chemical Polishing
Mo Foil - Chemical Cleaning/Polishing
Mo Sheet - Electrolytic Polishing
Mo-Nb Alloy Single Crystal - Alloy with 5 at.% Nb
MoS2 Single Crystal Specimens - Chemical Polishing
MoSe2 Single Crystal Specimens - Chemical Polishing
MoTe2 Single Crystal Specimens - Chemical Polishing
Molybdenum - Electrolytic Polishing
Molybdenum - Electrolytic Polishing - Mo Thin Foil Preparation
Molybdenum Single Crystal - Electrolytic Polishing
NaBrO3 - Polishing
NaCl (100) Cleaved Wafers - Chemical Polishing
NaCl (100) Cleaved Wafers - Chemical Polishing
NaCl (100) Cleaved Wafers - Chemical Polishing
NaCl (100) Wafers - Chemical Polishing
NaCl (100) Wafers - Chemical Polishing
NaCl (100) Wafers and Single Crystals - Chemical Polishing
NaCl - Polishing
NaCl - Polishing
NaCl - Polishing
NaCl - Polishing
NaCl - Polishing
NaCl - Polishing
NaCl - Polishing
NaCl - Polishing
NaCl - Polishing
NaClO3 - Polishing
NaF - Polishing
Nb (100) Oriented Single Crystal Rods - Chemical Polishing
Nb Specimens - Electrolytic Polishing
Nb-Mo Alloy - Single Crystal Alloys
Nb-Rh Alloys Single Crystal - Chemical Polishing
Nb-Sn Alloy (Nb3Sn) - Electrolytic Thinning and Polishing
Nb3Sn as Single Crystals - Chemical Polishing
Ni Specimens - Electrolytic Polishing
Ni-Al-Cu Steel - Fe-0.3C-4Ni-1Al-1Cu
Ni-Ge Alloys (Ni3Ge Single Crystal) - Electrolytic Polishing
Ni-V Alloy (Ni3V) - Electrolytic Thinning and Polishing
Ni50Al46Nb4 or Ni40Al39Nb21 Alloys - Twin Jet Polishing Mehod
NiAl Single Crystal Specimens - Electrolytic Polishing
NiAl Specimens and Alloys - Electrolytic Polishing
Nickel - Electrolytic Polishing
Nickel Alloys - Electrolytic Polishing
Nickel Single Crystal - Electrolytic Polishing
Nickel and Nickel Alloys - Electrolytic Polishing
Nimonic 80A - Electrolytic Thinning, Electrolytic Polishing
Niobium Single Crystal - Chemical Polishing
Niobium Single Crystal - Electrolytic Polishing
Niobium Single Crystal - Electrolytic Polishing
OsS2 Single Crystal Specimens - Chemical Polishing
OsTe2 Single Crystal Specimens - Chemical Polishing
Pads and Slurries for CMP in Microfabrication
Pb (100) Wafers - Chemical Polishing
Pb (100) Wafers - Electrolytic Polishing
Pb Single Crystal Specimens - Chemical Polishing
Pb(1-x)SnxSe (x = 0.03) - Electrolytic Polishing
Pb(NO3)2 Grown as Single Crystals - Chemical Polishing
PbMo04 - Polishing
PbS (100) Wafers - Chemical Polishing
PbS (100) Wafers - Electrolytic Polishing
PbS - Polishing
PbS - Polishing
PbS - Polishing
PbS - Polishing
PbS(1-x)Sx - Polishing
PbSe (100) Wafers and Other Orientations - Chemical Polishing
PbSe (100) Wafers and Other Orientations - Electrolytic Polishing
PbSe(1-x)Tex (x = 0.5) - Polishing
PbSnSe (100) Wafers - Electrolytic Polishing
PbSnTe (100) Wafers - Chemical Polishing
PbSnTe (100) Wafers - Electrolytic Polishing
PbTe (100) Wafers - Chemical Polishing
PbTe (100) Wafers - Chemical Polishing
PbTe (100) and PbSnTe (100) Wafers - Electrolytic Polishing
PbTe - Polishing
PbZrO3 Single Crystal Specimens - Chemical Polishing
PbZrO3 Single Crystal Specimens - Chemical Polishing
PbZrO3 Single Crystal Specimens - Chemical Polishing
Pd 99.95% Pure Single Crystal Specimens - Electrolytic Polishing
Polishing Etches for Silicon
Polishing Silicon Back-Side Removal (BSR) - Dry Etching
Pr (0001) Wafers - Chemical Polishing
PtAs2 Single Crystal Specimens - Chemical Polishing
PtP2 Single Crystal Specimens - Chemical Polishing
PtSb2 Single Crystal Specimens - Chemical Polishing
Pure Iron - Electrolytic Polishing
Pure Iron, Nitrided with kess than 0.015% C - Electrolytic Polishing
Pure Iron, Nitrided with less than 0.015% C - Electrolytic Polishing
Pure Iron, Nitrided with less than 0.015% C - Electrolytic Polishing
RbBr (001) Wafers - Chemical Polishing
RbI (001) Wafers - Chemical Polishing
Re (0001) Wafers - Electrolytic Polishing
Ru CPM - Polishing
RuS2 Single Crystal Specimens - Chemical Polishing
RuSe2 Single Crystal Specimens - Chemical Polishing
RuTe2 Single Crystal Specimens - Chemical Polishing
Rutile Single Crystal (TiO2) - Chemical Polishing
Sb (0001) Wafers Cleaved under LN2 - Chemical Polishing
Sb (0001) Wafers Cleaved under LN2 - Chemical Polishing
Sb Single Crystal Wafers - Chemical Polishing
Sc (0001) Wafers - Chemical Polishing
Sc (0001) Wafers - Chemical Polishing
Si (100) Wafers Used in Developing the Secco's Etchant - Chemical Polishing
Si (100) Wafers and Other Orientations - Abrasive Polishing
Si (100) Wafers and Other Orientations - Abrasive Polishing
Si (111) Pre-Cut Bars of Material - Chemical Polishing
Si (111) Wafers - Chemical Polishing
Si (111) Wafers - Chemical Polishing
Si (111) Wafers - Chemical Polishing
Si (111) Wafers - Chemical Polishing
Si (111) Wafers - Chemical Polishing
Si (111) Wafers - Abrasive Polishing
Si (111) Wafers Used as Substrates for Epitaxy Growth of Silicon - Chemical Polishing
Si (111) Wafers Used in a Defect Study - Electrolytic Etching/Polishing
Si (111) Wafers Used in a Study of Ag and Fe Ion Contamination - Chemical Polishing
Si (111) Wafers Used in a Study of Electrolytic Polishing with HF
Si (111) Wafers and Other Orientations - Abrasive Polishing
Si (111) Wafers and Other Orientations - Chemical Polishing
Si (111) Wafers and Other Orientations - Chemical Polishing
Si (111) Wafers and Other Orientations with n- and p-Type Resistivity - Chemical Polishing
Si (111) Wafers both p- and n-Type - Electrolytic Polishing
Si (111) Wafers, 5-50 Ohm cm Resistivity, n-Type - Chemical Polishing
Si (111) Wafers, n-Type, 5-10 Ohm cm Resistivity - Chemical Polishing
Si (111) Wafers, n-Type, Used to Fabricate Diffused p-n-p Transistors - Chemical Polishing
Si (111) and (100) n- and p-Type Wafers - Chemical Jet Polishing
Si (111) n-Type Wafers - Chemical Polishing
Si (111) n-Type Wafers - Electrolytic Jet Polishing
Si (111) n-Type Wafers - Electrolytic Jet Polishing
Si (111) n-Type Wafers - Electrolytic Jet Polishing
Si (111) n-Type Wafers, 130 Ohm cm Resistivity - Chemical Polishing
Si (111) n-Type Wafers, 50-500 Ohm cm Resistivity - Chemical Polishing
Si (111), (100) and (110) Wafers - Chemical Polishing
Si (111), (100), (112) and (110) Oriented Wafers - Chemical Polishing
Si (111), (100), n- and p-Type Wafers - Chemical Polishing
Si (111), n-Type, 10-15 Ohm cm Resistivity Wafers - Chemical Polishing
Si (111), p-Type Wafers, 0.1-200 Ohm cm Resistivity - Chemical Polishing
Si - Polishing
Si Single Crystal Spheres - Chemical Polishing
Si Single Crystal Spheres 1/2" Diameter - Chemical Polishing
Si Specimens - Chemical Polishing
Si Wafers - Chemical Polishing
Si Wafers - Electrolytic Polishing
Si Wafers - Electrolytic Polishing
Si Wafers and Other Orientations - Chemical Polishing
Si Wafers of Different Orientations - Electrolytic Polishing
Si and Ge (111) Wafers and Other Orientations - Chemical Polishing
Si and Ge Wafers - Chemical Polishing
Si n- and p-Type Wafers - Electrolytic Polishing
Si p-Type Wafers - Electrolytic Polishing
SiC (0001) Grown as Alpha-II SiC - Abrasive Polishing
SiC (0001) Wafers - Gas Polishing
SiC Single Crystal Specimens - Electrolytic Polishing
SiOi2 AT-Cut Quartz Crystal Blanks - Polishing
SiV2 Thin Films - Chemical Etching/Polishing
Silicon - Chemical Polishing
Silicon Wafer - Facet Polishing
Silver Single Crystal - Chemical Polishing
Silver Single Crystal - Chemical Polishing
Sirtl's Etchant - SiC (0001) Wafers - Chemical Polishing
SmBr3 (0001) Wafers - Alcohol Polishing
Sn (001) and (111) Wafers - Electrolytic Polishing
Sn (001) and (111)-Tetragonal Alpha-Tin Single Crystals - Electrolytic Polishing
Sn Single Crystal Wires - Electrolytic Polishing
Sn White-Tin Single Crystal - Chemical Polishing
SnTe (100) Wafers - Chemical Polishing
SnTe - Polishing
SnTe - Polishing
Sodium Chloride (NaCl) - Chemical Polishing of Single Crystal
SrTi03 - Polishing
SrTiO3 Single Crystal Specimens - Abrasive Polishing
SrTiO3 Single Crystal Specimens - Abrasive Polishing
SrWO4 Single Crystal Specimens - Chemical Polishing
Stainless Steel - Electrolytic Polishing
Superoxol - InP (100) Zn Doped p-Type Wafers - Chemical Polishing
Ta Material - Chemical Polishing
Ta Material - Electrolytic Polishing
TaMo Single Crystal Alloy - Electrolytic Polishing
TaN Thin Film Deposits - Chemical Polishing
Tantalum - Electrolytic Thinning and Polishing
Te (0001) Wafers - Chemical Polishing
Te (0001) Wafers - Chemical Polishing
Te (0001) and (1010) Wafers - Chemical Polishing
Te (1010) Wafers - Chemical Polishing
Te - Polishing
Ti-Al Alloy (Ti-8.6-10Al) - Electrolytic Polishing
Ti-Al System - Alloys with up to 5 at.% Al
Ti-Al-V Alloy (6Al-4V) - Electrolytic Polishing
Ti-Zr Alloy (25 at.% Ti) - Chemical Thinning and Polishing
Ti02 - Polishing
Ti02 - Polishing
TiC (001) Cleaved Wafers - Polishing
TiC (100) Thin Films - Electrolytic Polishing
TiC Single Crystal Ingot - Electrolytic Polishing
Titanium - Electrolytic Polishing
Titanium - Electrolytic Polishing
Titanium - Electrolytic Polishing
Titanium - Electrolytic Polishing
Titanium Alloys - Electrolytic Polishing
Titanium Alloys - Electrolytic Polishing
Titanium Alpha-Ti Single Crystal - Chemical Polishing
Titanium Carbide (TiC) Single Crystal - Electrolytic Polishing
Tl2Se3 and TlSe Single Crystal - Chemical Polishing
Tungsten Alloys - Electrolytic Polishing
Tungsten Alloys - Electrolytic Polishing
Tungsten Single Crystal - Electrolytic Polishing
Tungsten Single Crystal - Electrolytic Polishing, Chemical Polishing
UO2 Specimens - Electrolytic Polishing
UTi Single Crystal Specimens - Electrolytic Polishing
Unalloyed Steels - Electrolytic Polishing
Unalloyed Steels - Electrolytic Polishing
Unalloyed Steels - Electrolytic Polishing
Unalloyed Steels - Electrolytic Polishing
V3Si (111) Wafers - Electrolytic Polishing
V3Si (111) and (100) Wafers - Chemical Polishing
W (001) Wafers and Single Crystals - Electrolytic Polishing
W Specimens - Electrolytic Polishing
WRh (2%) and (6%), (100) Wafers - Electrolytic Polishing
Waspaloy - Twin Jet Polishing Mehod
White's Etchant - Si (100) Cleaved Wafers - Chemical Polishing
White's Etchant - Si (111) Eafers, n-Type, 130 Ohm cm Resistivity - Chemical Sphere Polishing
X-l114 Etchant - Ge (111) Wafers - Chemical Polishing
Y3Fe5O12 (YIG) Single Crystal Spheres - Abrasive Polishing
YAl2O4 - Polishing
Yttrium-Aluminium Garnets (Nd Doped) - Chemical Polishing
Zinc - Electrolytic Polishing
Zn (0001) Wafers and Ingots - Chemical Polishing
Zn - Polishing
Zn - Polishing
Zn - Polishing
Zn Alloy Single Crystal Platelets - Chemical Polishing
Zn Single Crystals - Chemical Polishing
Zn3As2 - Polishing
Zn3As2 - Polishing
ZnGeP2 - Polishing
ZnO (0O01) Wafers - Chemical Polishing
ZnS (100) Wafers - Chemical Polishing
ZnSe (100) Wafers - Chemical Polishing
ZnSe Single Crystal Wafers - Chemical Polishing
ZnSe Thin Films - Chemical Cleaning/Polishing
ZnSiP2 (100) Single Crystal Wafers - Chemical Polishing
ZnSnAs2 - Polishing
ZnTe (111) Wafers - Chemical Polishing
ZnTe - Polishing
ZnW (001) Cleaved Wafers - Chemical Polishing
Zr (0001) and (1010) Wafers - Electrolytic Polishing
ZrO2 Thin Film Deposits - Electrolytic Polishing