Tantalum and Chromium E-beam Deposition and Wet Etch Testing

Material Name: Tantalum
Recipe No.: 10301
Primary Chemical Element in Material: Ta
Sample Type: Single crystal
Uses: Etching
Etchant Name: None
Etching Method: Dry etching
Etchant (Electrolyte) Composition: See the data file.
Procedure (Condition): No data
Note: No data
Reference: Ning Cao, Staff Engineer, Nano-fabrication Lab, UCSB, Tantalum and Chromium E-beam Deposition and Wet Etch Testing, Website https://wiki.nanotech.ucsb.edu/wiki/Main_Page, 2020, pp. 1-5.

















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