Etchants for Germanium

100's Etchant - Ge (100) Wafers - Wet Etching
1:1:1 Etchant - Ge (111) and Si (111) Wafers - Chemical Polishing/Etching
BJ Etchant - Ge (111) Wafers - Chemical Polishing
Billig's Etchant - Ge (111) Wafers - Wet Etching
Billig's Etchant - Ge (111) Wafers Angle Lapped at 5°43' - Wet Etching
CP4 Etchants, Dilute CP4, Modified - Ge (111), (100), (110), and (211) Wafers - Wet Etching
CP4, Dilute Etchant - Ge (111) Wafers - Wet Etching
Camp No. 2 (Superoxol, CP2) Etchant - Ge (111) Wafers - Wet Etching
Camp No. 3 (CP3) Etchant - Ge (111) Wafers - Wet Etching
Camp No. 4 (CP4) Etchant - Ge (100) Wafers and Other Orientations - Chemical Polishing/Etching
Chalcogenide Glasses (ChG)-Ge23Sb7S70 - Dry Etching
Chlorine-Based Chalcogenide Etch I - Dry Etching
Cleaning Solution for Germanium Wafers
Ellis's No. 5 Etchant - Ge Spheres and Hemispheres - Wet Etching
Fluorine-Based Chalcogenide Etch II - Dry Etching
Fluorine-Based Chalcogenide Etch II - Dry Etching
Formation of Textured Surfaces of Ge Using i-MacEtch - MacEtch
Gallium Arsenide (GaAs) - Selective Etch for Dislocations on (111) Plane
Ge (001) Surface Cleaning Methods for Device Integration
Ge (100) Very Thin Films Grown by PECVD on NaCl, Ge Wafers - Thermal Cleaning
Ge (100) Wafers - Vacuum Cleaning
Ge (100) and (110) Wafers - Wet Etching
Ge (100) and (111) Wafers - Metal Etching
Ge (100) wafers Cut within 1° of Plane - Physical Cleaning
Ge (111) 5-10 Ohm cm Resistivity n-Type Wafers - Wet Etching
Ge (111) Wafer and Spherical Shot - Wet Etching
Ge (111) Wafer with p-n Junctions - Electrolytic Etching
Ge (111) Wafers - Chemical Cleaning
Ge (111) Wafers - Chemical Cleaning
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Chemical Polishing
Ge (111) Wafers - Electrolytic Etching
Ge (111) Wafers - Electrolytic Etching
Ge (111) Wafers - Electrolytic Etching
Ge (111) Wafers - Electrolytic Etching
Ge (111) Wafers - Electrolytic Etching
Ge (111) Wafers - Electrolytic Plating
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Electrolytic Polishing
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Wet Etching
Ge (111) Wafers - Abrasive, Damage
Ge (111) Wafers - Acid, Stress
Ge (111) Wafers - Cleave
Ge (111) Wafers - Junction Testing
Ge (111) Wafers - Metal, Structure
Ge (111) Wafers Fabricated as p-n Junction Diodes - Wet Etching
Ge (111) Wafers Fabricated with Indium p-n Junctions - Junction Testing
Ge (111) Wafers Used as Substrates for Ge Epitaxy Growth - Wet Etching
Ge (111) Wafers and Cylinders - Metal Diffusion
Ge (111) Wafers and Ingots - Wet Etching
Ge (111) Wafers and Other Orientations - Electrolytic Etching
Ge (111) Wafers and Other Orientations - Gas Oxidation
Ge (111) Wafers and Other Orientations - Wet Etching
Ge (111) Wafers and Other Orientations - Wet Etching
Ge (111) Wafers and Other Orientations - Wet Etching
Ge (111) Wafers p-Type - Chemical Polishing
Ge (111) Wafers with Epitaxy Grown Ge Layers - Gas Etching
Ge (111) Wafers with Indium - Metal Decoration
Ge (111) Wafers with Lithium Diffused p-n Junctions - Wet Etching
Ge (111) Wafers, p-Type, 4 Ohm cm Resistivity - Chemical Polishing
Ge (111) and (100) Wafers - Wet Etching
Ge (111) and (100) Wafers - Solution Used as a Preferential Etch
Ge (111) and (100) Wafers Used as Substrates - Chemical Polishing
Ge (111) n-Type Wafers - Electrolytic Etching
Ge (111) n-Type Wafers - Wet Etching
Ge (111) n-Type, 0.004-40 Ohm cm Resistivity Wafers - Electrolytic Polishing
Ge (111), (100), (110) and (211) Wafers - Wet Etching
Ge (111), (100), (110) and (211) Wafers - Wet Etching
Ge (111), (100), (110) and (211) Wafers - Wet Etching
Ge (111), (100), (110), and (211) Wafers - Wet Etching
Ge (111), (100), (110), and (211) Wafers - Wet Etching
Ge (111), (100), and (110) Wafers - Chemical Polishing
Ge (111), (110) and (100) Wafers - Wet Etching
Ge (111), (110), (100), (211) Wafers and Single Crystal Spheres - Wet Etching
Ge (111), (110), (100), (211) Wafers and Single Crystal Spheres - Wet Etching
Ge (111), (110), and (211) Wafers - Wet Etching
Ge (111), p- and n-Type Wafers - Electrolytic Polishing
Ge - Chemical Polishing
Ge - Chemical Polishing
Ge - Chemical Polishing
Ge - Dry Etching
Ge - Germanium - Dry Etching
Ge - Germanium - Wet Etching
Ge - Polishing
Ge - Wet Etching
Ge - Wet Etching
Ge - Wet Etching
Ge - Wet Etching
Ge - Wet Etching
Ge Single Crystal - Acid, Cover
Ge Single Crystal Hemispheres - Wet Etching
Ge Single Crystal Specimens
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Spheres - Wet Etching
Ge Single Crystal Wire Dilaments - Electrolytic Shaping
Ge Single Cyrstal Spheres - Wet Etching
Ge Specimens - Chemical Oxidation
Ge Specimens - Electrolytic Etching
Ge Sphere - Wet Etching
Ge Spheres of Single Crystal Germanium and Silicon - Chemical Polishing
Ge Thin Films - Dislocation Etching
Ge Thin Films Evaporated on GaAs:Cr (SI) Substrates - Chemical Cleaning
Ge Thin Films Evaporated on GaAs:Cr (SI) Substrates - Wet Etching
Ge Thin Films Evaporated on Si, Al, Al2O3, GaAs, C Substrate - Dry Etching
Ge Wafers - Chemical Polishing
Ge Wafers - Chemical Polishing/Wet Etching
Ge Wafers - Wet Etching
Ge Wafers - Wet Etching
Ge Wafers - Wet Etching
Ge Wafers - Chemical Thinning
Ge Wafers - Metal, Contamination
Ge Wafers Doped with Copper - Chemical Polishing
Ge Wafers Studied for Neutron Irradiation Effects
Ge Wafers Used as Substrates - Chemical Polishing
Ge Wafers of Different Orientations - Chemical Cleaning
Ge Wafers of Different Orientations - Dislocation Etching
Ge and Bi2Se3 Nanowires - Wet Etching
Ge and InP (100) and (111) Wafers - Chemical Thinning
Ge and Si Discs
Ge and Si Wafers - Chemical Polishing
Ge and Si Wafers - Electrolytic Oxidation
Ge and Si Wafers - Ionized Gas Cleaning
Ge as Single Crystal - Chemical Polishing/Etching
Ge as Single Crystal Spheres - Chemical Polishing
Ge as Single Crystal Spheres - Molten Flux Etching
Ge n-Type Wafers - Chemical Polishing
Ge(x)Se(1-x) Thin Films - Wet Etching
Ge(x)Se(x-1) Thin Films - Wet Etching
Ge0.89Sn0.11 Layer - Wet Etching
Ge0.922Sn0.078 - Dry Etching
Ge2O3, DC Sputtered Thin Films - Wet Etching
Ge2Sb2Te5 (GST) - Dry Etching
Ge2Sb2Te5 (GST) Thin Film - Dry Etching
Ge2Sb2Te5 - Dry Etching
Ge2Sb2Te5 - Wet Etching
Ge3N4 - Wet Etching
Ge3N4 Thin Films - Gas Densification
Ge3N4 and Ge3O(1-x)N(x) - Wet Etching
Ge3N4 and Ge3OxNy Thin Films - Wet Etching
Ge3Nx - Wet Etching
Ge:Sb Thin Film - Wet Etching
GeAs (111) Wafer - Wet Etching
GeAs (111) Wafers - Wet Etching
GeAs (111) Wafers - Wet Etching
GeAs (111) Wafers - Wet Etching
GeO2 Thin Films - Gas Forming
GeO2, Ge3N4, HfO2, InAlAs, InSb - Wet Etching
GeS - Wet Etching
GeS Single Crystal Platelets - Chemical Cleaning
GeSe - Wet Etching
GeTe - Polishing
GeTe Single Crystal Specimens - Wet Etching
Germanium - Dry Etching
Germanium - Dry Etching
Germanium - Jet Thinning by Chemical Polishing
Germanium - Wet Etching
Germanium - Wet Etching
Germanium - Wet Etching
Germanium Etchant (and Germanium Silicon) Callium Arsenide - Wet Etching
Germanium Single Crystal - Wet Etching
Germanium Single Crystal - Wet Etching
Germanium Single Crystal - Wet Etching
Germanium, Silicon, and Polysilicon Isotropic Etchants and Etch Processes
GexSi(1-x)- Germanium Silicide - Dry Etching
GexSi(1-x)- Germanium Silicide - Wet Etching
Mesoporous Ge Layer - Wet Etching
Peroxide Etchant (on Germanium) - Ge (100) Wafers - Wet Etching
Poly Ge LPCVD Undoped
RCA SC-1 - Wet Etching
RIE Ge Etch Study Parameters - Dry Etching
Solutions for Chemical Polishing and Preferential Etchants for Defect Detection for Ge
Superoxol Etchant - Ge (111) Wafers - Wet Etching
Superoxol Etchant - Ge (111) Wafers Lithium Diffused - Wet Etching
WAg Etchant - Ge (111) Wafers - Wet Etching
White's Etchant - Ge (111) Wafers - Wet Etching
White's Etchant - Ge Wafers - Wet Etching
X-l114 Etchant - Ge (111) Wafers - Chemical Polishing
a-Ge Evaporated on Fused Quartz Blanks
a-Ge Thin Film Grown on NaCl - Acid, Float-off
a-Ge Thin Films Deposited on NaCl - Acid, Float-off
a-Ge as Thin Film Material Deposited on NaCl (100) Substrates - Float-off
a-Ge-H and a-Si-H Hydrogenated Thin Films - Chemical Cleaning/Etching

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