Dry Etching of Cr Hard Mask

Dry Etching of Cr Hard Mask

Material Name: Cr
Recipe No.: 10324
Primary Chemical Element in Material: Cr
Sample Type: Layer
Uses: Etching
Etchant Name: None
Etching Method: Dry etching
Etchant (Electrolyte) Composition: See the Figure 1.
Procedure (Condition): No data
Note: No data
Reference: Metal Etching with the Bosch Process, Chaphel Hill Analytics and Nanofabrication Laboratory, University of North Carolina, PowerPoint Presentation, 2011, pp. 1-16.

Figure 1: Wet to dry etching of Cr hard mask.

Figure 2: Increased passivation time.

Figure 3: Same process, different results.

Figure 4: Reduced passivation time.

Figure 5: Attempts to reduce grass.

Figure 6: Switched to SiO2 mask and reduced passivation time, but still some grass.

Figure 7: Where we stand.