Alphabetical Index
Browse by Elements
Keyword Search

Dry Etchants
Dry and Wet Etchants
Wet Etchants

Bulk Etchants
Layer Etchants
Nano Etchants
Single Crystal Etchants
Thin Film Etchants
Thin Foil Etchants
Wafer Etchants

Al Etchants
Cd Etchants
Ga Etchants
Ge Etchants
In Etchants
New Etchants
Other Etchants
Si Etchants
Zn Etchants

Help
Home

Chrome - Dry Etching

Material Name: Chrome
Recipe No.: 10327
Primary Chemical Element in Material: Cr
Sample Type: Layer
Uses: Etching
Etchant Name: None
Etching Method: Dry etching
Etchant (Electrolyte) Composition: Cl2=40 sccm, RF=80 W, Pressure=30 mTorr, 150 sec for 15 nm.
Procedure (Condition): No data
Note: Trion etcher
Reference: Ricardo Garcia, Marylène Palard, DRY ETCHING CAPABILITIES, Texas Nanofabrication Facility (TNF) node of the National Nanotechnology Coordinated Infrastructure, UTexas at Austin, 2016, PowerPoint Presentation, pp. 1-18.