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Quartz Wet Etching

Material Name: Quartz
Recipe No.: 10340
Primary Chemical Element in Material: Si
Sample Type: Layer
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition:
- Solution used : Ammonium bifluorure
- Concentration : 1 volume HF 50% for 1 volume NH4F 40% in H2O
- Temperature : 80°C max
- Stirring : magnetic
- Etching rate : some microns/min
Procedure (Condition): No data
Note: No data
Reference: WET ETCHING BENCH (KOH BHF), Website https://www.femto-st.fr, 2020.