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Wet Etching of Silicon Dioxide

Material Name: SiO2
Recipe No.: 10341
Primary Chemical Element in Material: Si
Sample Type: Layer
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition: See the data file.
Procedure (Condition): No data
Note: No data
Reference: WET ETCHING OF SILICON DIOXIDE, Website www.microtechweb.com, 2020, p. 1.