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Wet Etching Recipes

Material Name: InP, Al2O3, Si, SiO2, Si3N4, Ta2O5, TiO2
Recipe No.: 10343
Primary Chemical Element in Material: In, Al, Si, Ta, Ti
Sample Type: Wafer, layer
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition: See the data file.
Procedure (Condition): No data
Note: No data
Reference: Wet Etching Recipes, Website https://www.nanotech.ucsb.edu, 2020.