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Wet-Chemical Etching and Cleaning of Silicon

Material Name: Silicon
Recipe No.: 10351
Primary Chemical Element in Material: Si
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Dry etching
Etchant (Electrolyte) Composition: See the data file.
Procedure (Condition): No data
Note: No data
Reference: Wet-Chemical Etching and Cleaning of Silicon, Virginia Semiconductor, Inc., 2003, pp. 1-11.