Comparison of Anisotropic Wet Etchants - Wet Etching

Material Name: Silicon
Recipe No.: 10358
Primary Chemical Element in Material: Si
Sample Type: Wafer
Uses: Etching
Etchant Name: EDP, KOH, TMAH etchants
Etching Method: Wet etching
Etchant (Electrolyte) Composition: See the Table 1.
Procedure (Condition): No data
Note: No data
Reference: Bailey Anderson Yin, Fabrication of Silicon Nanowires with Controlled Nano-scale Shapes Using Wet Anisotropic Etching, PhD Thesis, University of Texas at Austin, p. 6.

Table 1: Comparison of anisotropic wet etchants.


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