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Si Single Crystal Hemispheres - Wet Etching

Material Name: Si single crystal hemispheres
Recipe No.: 1929
Primary Chemical Element in Material: Si
Sample Type: Single crystal
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition: x...H2O2 (30%), conc. Note: The volume/quantity was not shown in the referenced article and is therefore designated as an "x".
Procedure (Condition): Time: 2-4 h, temperature: RT.
Note: Si single crystal hemispheres. specimens were used in an etching study to observe etch patients, type etch pits, etch rates, and crystal planes developed. Before preferential etching, etch polish in CP4 to remove lapping damage.
Reference: Holmes, P J - Acta Metall, 7,283(1959).