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Agua Regia - Si (111) and (100) Wafers - Chemical Cleaning

Material Name: Si (111) and (100) wafers
Recipe No.: 1940
Primary Chemical Element in Material: Si
Sample Type: Wafer
Uses: Cleaning
Etchant Name: Agua Regia
Etching Method: Chemical cleaning
Etchant (Electrolyte) Composition: 3 parts HCl, 1 part HNO3 (Agua Regia).
Procedure (Condition): No data
Note: Si (111) and (100) wafers used in a study of high pressure oxidation (800-1000°C and 1-20 min) using dry oxygen. wafers were cleaned prior to oxidation: (1) H2SO4:H2O; (2) Aqua Regia and (3) 1 HF:10 H2O and spin dry in nitrogen.
Reference: Perrin Walker, William H Tarn: Handbook of Metal Etchants, CRC Press, Boca Raton, Florida, USA, 1990, p. 1072.