Alphabetical Index
Browse by Elements
Keyword Search
Dry Etchants
Dry and Wet Etchants
Wet Etchants
Bulk Etchants
Layer Etchants
Nano Etchants
Single Crystal Etchants
Thin Film Etchants
Thin Foil Etchants
Wafer Etchants
Al Etchants
Cd Etchants
Ga Etchants
Ge Etchants
In Etchants
New Etchants
Other Etchants
Si Etchants
Zn Etchants
Help
Home
Si Single Crystal Spheres - Wet Etching
Material Name: Si single crystal spheres
Recipe No.: 1949
Primary Chemical Element in Material: Si
Sample Type: Single crystal
Uses: Etching
Etchant Name: None
Etching Method: Wet (chemical) etching
Etchant (Electrolyte) Composition: 1.) 250 ml 30% KOH. 2.) 250 ml 30% NaOH.
Procedure (Condition): Temperature: Boiling
Note: Si single crystal spheres and oriented cut forms used in a study of structure. The sphere finite crystal, form was tetrahexahedron, (hkO). Weirach, D F - J Appl Phys, 16,1378(1977).
Si single crystal spheres were etched in 10 M KOH, 10 min at 80 C. Finite crystal form was tetrahexahedron (hkO).
Reference: See the above text.