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Citric Acid:H2O2 - InGaAs/AlGaAs/GaAs - Wet Etchant by Chemical Composition

Material Name: InGaAs/AlGaAs/GaAs
Recipe No.: 4958
Primary Chemical Element in Material: In, Al, Ga
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition: Citric acid:H2O2:H2O
Procedure (Condition): No data
Note: Wet etchant by chemical composition. Study of GaAs versus Al0.28Ga0.72As etch rate dependence on citric acid:H2O2 ratio and on H2O concentration; Ref. (Mao, B.-Y., 1994).
Reference: A.R. Clawson, Guide to references on III-V semiconductor chemical etching, Materials Science and Engineering (Original Reference List), 31 (2001), p. 158.