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KOH:Methanol - InP - Wet Etchant by Chemical Composition

Material Name: InP
Recipe No.: 5948
Primary Chemical Element in Material: In
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition: KOH:methanol (2.5 g:200 ml)
Procedure (Condition): No data
Note: Wet etchant by chemical composition. InP surface cleaning study for Schottky contacts; Ref. (Dunn, J., 1988).
Reference: A.R. Clawson, Guide to references on III-V semiconductor chemical etching, Materials Science and Engineering (Original Reference List), 31 (2001), p. 233.