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InP (100) - Wet Etching

Material Name: InP (100)
Recipe No.: 6536
Primary Chemical Element in Material: In
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition: 1N K2Cr2O7:HBr:CH3COOH (3:1:1)
Procedure (Condition): No data
Note: Wet etchant by chemical composition. Application: InP (100) grating etch for BH laser.
Reference: MATSUOKA, T., H. Nagai, Y. Itaya, Y. Noguchi, Y. Suzuki, and T. Ikegami, CW Operation of DFB-BH GaInAsP/InP Lasers in 1.5 µm Wavelength Region, Electron. Lett., 18, 27-28 (1982).