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GaSb-Based Materials - Wet Etching

Material Name: GaSb
Recipe No.: 8517
Primary Chemical Element in Material: Ga
Sample Type: Thin film, bulk
Uses: Etching
Etchant Name: None
Etching Method: Wet etching
Etchant (Electrolyte) Composition: In the experiment, four kinds of HCl solutions were used: HCl + HNO3 (30 + 1) @T = 5 C, 37% HCl, HNO3 + (0.08M HCl + CH3COOH) and HCl + H2O2 + H2O 60 + 1 + 1). See the Table 1.
Procedure (Condition): No data
Note: No data
Reference: Minghui You, et al., Study on HCl system wet-etching process of GaSb-based materials, 4th International Conference on Machinery, Materials and Information Technology Applications (ICMMITA 2016), Advances in Computer Science Research, volume 71, 2017, pp. 90-93.

Table 1: The surface conditions 4 HCl systems etched with different etching rate.