Alphabetical Index
Browse by Elements
Keyword Search

Dry Etchants
Dry and Wet Etchants
Wet Etchants

Bulk Etchants
Layer Etchants
Nano Etchants
Single Crystal Etchants
Thin Film Etchants
Thin Foil Etchants
Wafer Etchants

Al Etchants
Cd Etchants
Ga Etchants
Ge Etchants
In Etchants
New Etchants
Other Etchants
Si Etchants
Zn Etchants

Help
Home

Resist Mask Wear Out

Material Name: Silicon
Record No.: 138
Primary Chemical Element in Material: Si
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Dry etching
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: See the Fig. 1.
Reference: John D. Williams, Fall 2008 EE 410/510:Microfabrication and Semiconductor ProcessesM W 12:45 PM –2:20 PMEB 239 Engineering Bldg., University of Alabama in Huntsville, PowerPoint Presentation, 1999, pp. 1-91.


Figure 1: Resist mask wear out.