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Photoresist Under-Exposure

Material Name: Photoresist
Record No.: 151
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: No data
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: See the Fig. 1.
Reference: Troubleshooting for Printed Board Fabrication Processes, IPC-9121, PCB Sections of IPC-PE-740A - December 1997, p. 1-1.


Figure 1: Photoresist under-exposure