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Particle Defect

Material Name: Contacs
Record No.: 183
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: No data
Etchant Name: None
Etching Method: No data
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: As shown in Figure 1, two poly lines are shorted together and caused the scan chain failure. As our program produces the results just in 20 minutes, it significantly reduced the engineer time to find the final defect location and showed the effectiveness the proposed technique.
Reference: Ruifeng Guo, Srikanth Venkataraman, A New Technique for Scan Chain Failure Diagnosis, ISTFA 2002, Proceedings of the 28th International Symposium for Testing and Failure Analysis, 3-7 November 2002, Phoenix Civic Center, Phoenix, Arizona, pp. 723-732.


Figure 1: Particle Defect in the Unit of Design D.