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Process Induced Defects: Haze

Material Name: Silicon
Record No.: 29
Primary Chemical Element in Material: Si
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: No data
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: No data
Reference: Website https://www.tf.uni-kiel.de/matwis/amat/elmat_en/index.html, 2020.


Figure 1: Classical "Haze". Small etch pits in rather large density denote metal precipitates. The "Tweezer marks" in the other set of pictures are haze, too, but at the edge of the detection limit.