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Reticle Tilt Defect

Material Name: Wafer
Record No.: 63
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Etching
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: EagleView easily spots reticle tilt semiconductor wafer defects which may look similar to lens wafer defects. Typically, a reticle tilt wafer macro defect goes across a stepper shot while a lens wafer macro defect tends to show a difference within the stepper shot. In this case, the center of the lens field is different than the edge of the lens field.
Reference: Website https://www.microtronic.com/defect-library/reticle-tilt-defect/, Image and text by courtesy of Microtronic company, 2020.


Figure 1: Above is an example of a blocked etch macro defect identified by EAGLEview where the semiconductor wafers were rotated from their normal semiconductor wafer position on an etch tool. The flat edge of the clamp covered the semiconductor wafers and then these areas did not receive a complete etch.