Scratches By Human

Scratches By Human

Material Name: Wafer
Record No.: 70
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Etching
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: No data
Reference: Website https://www.microtronic.com/defect-library/scratches-by-human/, Image and text by courtesy of Microtronic company, 2020.

Figure 1: Example of semiconductor wafer macro defect that is a scratch made by a person as opposed to a machine. Scratches made by operators usually look like a shaky line typically due to wafer handling. Macro defect scratches made by machines usually look very straight in comparison.

Figure 2: Additional example of a semiconductor wafer scratch made by a person. EAGLEview easily identifies scratches no matter where they occur on the semiconductor wafer.

Figure 3: Additional example of a semiconductor wafer macro defect which is a scratch made by a person.