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Partial Pattern – No Expose

Material Name: Wafer
Record No.: 74
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Etching
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: No data
Reference: Website https://www.microtronic.com/defect-library/partial-pattern-no-expose/, Image and text by courtesy of Microtronic company, 2020.


Figure 1: Above are several examples of a partial pattern macro defect caused by the stepper not completing exposure of the semiconductor wafer. In some cases, the majority of the wafer is not exposed and the semiconductor wafer is reworked.