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Poly Haze Macro Defect

Material Name: Wafer
Record No.: 75
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Etching
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: No data
Reference: Website https://www.microtronic.com/defect-library/poly-haze-macro-defect/, Image and text by courtesy of Microtronic company, 2020.


Figure 1: A poly haze macro defect appearing on a semiconductor wafer is caused by a poly deposition process problem that can be easily detected by the EAGLEview system. The poly haze macro defect appears as a bright spot on the semiconductor wafer’s edge. The wafer macro defect may effect a single wafer or many wafers in the lot as can be seen by the images above.