Wafer Contamination

Wafer Contamination – Large

Material Name: Wafer
Record No.: 86
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Etching
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: No data
Reference: Website https://www.microtronic.com/defect-library/wafer-contamination-large/, Image and text by courtesy of Microtronic company, 2020.

Figure 1: An example of a large contamination macro defect found by EAGLEview on a semiconductor wafer that has an irregular shape.

Figure 2: An additional example of a semiconductor wafer macro defect caused by contamination.

Figure 3: EAGLEview image depicting a large contamination macro defect on the semiconductor wafer.

Figure 4: Large contamination macro defect detected by EAGLEview on semiconductor wafer.