3 Chamber Macro Defect

Material Name: Wafer
Record No.: 93
Primary Chemical Element in Material: No data
Sample Type: Wafer
Uses: Etching
Etchant Name: None
Etching Method: Etching
Etchant (Electrolyte) Composition: No data
Procedure (Condition): No data
Note: No data
Reference: Website https://www.microtronic.com/defect-library/3-chamber-macro-defect/, Image and text by courtesy of Microtronic company, 2020.


Figure 1: Example of a semiconductor wafer with a macro defect caused by a 3-chamber issue.


Figure 2: EAGLEview automatically and clearly indicates that every third incoming wafer is flagged which points toward there being a 3-Chamber issue or wafer defect.

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