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GaAs (100) wafers fabricated as diodes - Electrolytic polishing

Material Name: GaAs (100) wafers fabricated as diodes
Recipe No.: 6518
Primary Chemical Element in Material: Ga
Sample Type: Wafer
Uses: Polishing
Etchant Name: None
Type (Macro/Micro): Micro
Etching Method: Electrolytic polishing
Etchant (Electrolyte) Composition: x...KOH, x...H2O. Note: The volume/quantity was not shown in the referenced article and is therefore designated as an "x".
Procedure (Condition): Anode: GaAs.
Note: GaAs (100) wafers fabricated as diodes in a study of electroluminescent properties with negative resistance. Solution used to electropolish and develop p-n junctions.
Reference: Wieser, K & Levitt, R S - J Appl Phys, 35,2431(1964).