Thin Film Etchants

Thin Film Etchants

Extraction replica etchant for Cu alloys - Chemical etching
Extraction replica etchant for mild and low alloy steels - Chemical etching
Extraction replica etchant for high chromium and alloy steels - Chemical etching
Extraction replica etchant for high speed steels - Chemical etching
Extraction replica etchant for stainless steels - Chemical etching
Extraction replica etchant for nickel alloys - Chemical etching
Extraction replica etchant for titanium alloys - Chemical etching
Aluminium thin film - Cleaning etch
Aluminium thin film - Cleaning etch
Aluminium thin film - Cleaning etch
Aluminium thin films on semiconductor wafers - Cleaning etch
Aluminium thin films deposited on GaAs and Si (100) wafers - Cleaning etch
Aluminium thin films - Chemical cleaning
Krumm's etchant - Al thin films evaporated on GaAs, (100) wafer substrates
Aluminium thin films evaporated on silicon and Gallium arsenide - Chemical etching
Aluminium thin films evaporated on GaAs - Al thin films evaporated on GaAs, (100) substrates used in fabricating GaAs FETs
Aluminium alloys - Al alloys as sheet material and as an evaporated thin film on other materials
Aluminium thin film - Reactive ion etching
Al thin films and crystalline aluminum sheet - Solution shown was used to etch channels in the aluminum
Aluminium thin film - Chemical etching
Al (100) wafers - Thermal etching
Al thin films deposited on GaAs - Physical etching
Al, and A12O3/A1N thin films - Gas etching
Al foil with an Al2O3 thin Film
Al thin film on (100) silicon wafers - Chemical etching
Al thin films deposited on silicon substrates - Physical etching
Al thin film - Ketone, lift-off
Al thin film on quartz substrate - Gas, removal
Al thin films evaporated on SiO2, Al2O3, and ZrO2 substrates - Alkali, removal
Al evaporated on KCl - Al, evaporated on KCl, (100) and (111) cleaved substrates as oriented thin films
Al-Ni alloy thin film - Chemical etching
Al-Ni alloy thin films - Flux etching and cleaning
Al-Ni, alloy thin film coatings - Etching
AlAs thin films - Chemical polishing
AlAs (110) wafers - Gas, oxidation
AlN thin film on (111) silicon wafer - Chemical etching
AlN thin film on (100) gallium arsenide - Chemical etching
AlN thin films - Thermal etching
AlN on Si and GaAs substrates - Chemical etching
AlN thin films (100) and (111)-Acid, float-off
AlN thin films deposited on GaAs-Zn doped - Chemical etching
Al2O3 thin film - Chemical etching
Al2O3 and Al2PxOy thin films - Solvent, cleaning
Al2O3, native oxide films on AlAu alloys - Chemical etching - (cleaning)
Al2O3, thin film deposited on silicon - Photochemical, forming
Al2O3 thin film deposition on InGaAsP/InP - Oxide, passivation
Al2O3 thin film - Electrolytic etching
Al2O3 thin films DC reactively sputtered on (111) silicon wafers - Chemical etching
Be thin film - Acid, removal
Be thin film - Electrolytic thinning
Be thin film - Freeze etchant
Bi2O3 deposited as a thin film - Chemical etching
Au thin films - Gas, diffusion
Au/TiW thin - Films on Al film deposited on (111) silicon wafers-xgas, blister forming
B grown as thin films - Growth
MoB surface penetration film - Chemical etching
BN as pressed powder test blanks
BNorphous thin films - Chemical etching
BN single crystal films-Gas, crystallization
CdO as a surface oxide - Chemical cleaning
CdO native oxide - Chemical etching
CdP2 deposited as a thin film on InP - Chemical etching
CdSe as a deposited polycrystalline thin film - Chemical etching
CdSe polycrystalline thin film - Chemical polishing
CdSe and (Cd,Se)xZn(1-x) single crystal thin films - Chemical etching
CdSe thin film - Chemical etching
CdSe thin film - Chemical etching
CaF2 (100) thin films deposited on GaAs, (100) substrates - Chemical etching
CaSnF2 thin film - Chemical etching
Ca2N3 thin films - Chemical etching
C as thin films - Cleaning
Cr thin films deposits - Chemical etching
Cr as evaporated deposits in vacuum systems - Chemical cleaning
Cr as evaporated deposits in vacuum systems - Chemical cleaning
Chrome etchants, modified - Cr thin film deposits on glass substrates
Chrome etchant - For Cr thin films
Cr thin films - Chemical etching
Chrome etchant - Cr thin films - Chemical etching
Chrome etchant - Au-Cr thin films - Chemical etching
Cr thin films - Gas oxidation
Cr thin films - Physical etching
Kodak's EB-5 etchant - Cr thin films - Chemical etching
Cr evaporated thin films - Chemical etching
Chrome etchant - Cr2O3orphous thin films - Chemical etching
Cr2O3 thin film - Chemical etching
P2Cr5 thin film - Chemical etching
Copper thin films - Chemical etching
Cu thin films evaporated on NaCl - Acid, float-off
Cu-Pd thin film - Chemical etching
Cu2O as a native oxide thin film on surfaces - Oxide removal
Cu2O as a native oxide on copper surfaces - Acid removal
Cu2O thin films - Chemical cleaning
Cu20 thin films - Acid oxidation
CuInTe2 thin films - Acid, float-off
CuInTe2 thin films - Chemical thinning
TiD2 as thin films - Chemical etching
ScD as thin films - Chemical etching
Er as an evaporated thin film - Chemical etching
ErH2 and ErH3 - Acid, float-off
Fe2O3 thin film - Chemical etching
GdTbFe thin films - Chemical etching
GaAs as thin film epitaxy grown on germanium substrate - Chemical etching
(Ga,Al)As-Be p-type thin films - Chemical etching
GaN thin films - Chemical etching
GaN (0001) single crystal thin films - Chemical etching
GaN thin films grown by MBE on (0001), and (01.12) single crystals sapphire substrates to 1000 A thickness - Thermal cleaning
Ga2O3 as native oxide on GaAs - Physical etching
Ga2O3 as native oxide on GaAs (100) wafers - Physical etching
Ga2O3 thin film growth of GaAs, (100), p-type wafers - Chemical oxidizing
a-Ge thin film grown on NaCl-Acid, float-off
Ge thin films evaporated on Si, Al, Al2O3, GaAs, C substrate - Physical etching
a-Ge thin films deposited on NaCl - Acid, float-off
Ge thin films evaporated on GaAsCr (SI) substrates - Chemical etching
Ge thin films evaporated on GaAsCr (SI) substrates - Chemical cleaning
Ge (100) very thin films grown by PECVD on NaCl, Ge wafers - Thermal cleaning
Ge thin films - Dislocation etching
a-Ge as thin film material deposited on NaCl (100) substrates - Float-off
a-Ge-H and a-Si-H hydrogenated thin films - Chemical cleaning/etching
InGe used as a deposited Au/InGe alloy contact on (100) InP and GaAs wafers - Chemical etching
Agua Regia - SnGe (1%) thin films - Chemical etching
Fe3Ge3 thin films - Chemical etching
Nb3Ge thin films - Chemical etching
Ge3N4 and Ge3OxNy thin films - Chemical etching
Ge3N4 thin films-Gas densification
GeO2 thin films-Gas forming
Ge2O3, DC sputtered thin films - Chemical etching
Ge(x)Se(1-x) thin films - Chemical etching
Ge(x)Se(x-1) thin films - Chemical etching
Agua Regia - Au thin films and specimens - Chemical etching
Au thin films deposited on soda-lime glass - Thermal, structure
Chrome etchant - Au thin films and specimens - Chemical etching
Au thin film deposited by CVD - Metal diffusion
Au (100) single crystal thin films - Specimen preparation
Au thin films deposited on (0001) muscovite mica substrates - Acid, float-off
Au thin films evaporated on alumina substrates - Gas, drying
Au thin film deposits on silicon wafers - Chemical etching
Au thin films - Chemical ecthing
Au thin film deposited on glass - Chemical etching
Au thin films deposited on glass - Chemical etching
Tri-iodine etchant - Au thin film deposits as a multilayer Au/Ni/Au/TiW/Si(100) substrate - Chemical etching
Au thin films pulse plated on alumina blanks - Gold plating
Au thin films - Electrolytic polishing
Au as hard gold coatings on copper substrates - Metal plating
Au thin films deposited on (100) NaCl substrates - Acid, float-off
Au thin films - Thermal etching
AuGa2 (100) oriented thin films on NaCl - Chemical etching
Au-Ga thin films EB evaporated on NaCl (100) substrates - Gas, aging defects
Agua Regia - AuSn (20%) alloy as an evaporated thin film - Chemical etching
AuSn (20%) alloy as evaporated thin films - Chemical etching
Au-Zn as an evaporated metal contact on InGaAsP/InP(100) - Chemical ecthing
Hf thin films deposited on silicon wafers - Chemical etching
HfN thin film - Chemical cleaning
Ho-Co alloy sputter deposited on Glass and NaCl, (100) substrates - Ionized gas cleaning
NbH deposited on silicon wafers - Chemical etching
In2O3 as thin film - Chemical etching
InSb thin films - Chemical polishing
InGaSb deposited as a thin film on BaF2 substrate (111) - Chemical thinning
InGaAs (001) thin film - Chemical etching
In2O3 (1010) grown as an oriented thin film - Chemical etching
In2O3 (1010) deposited oriented thin film - Chemical etching
In2O3 (1010) oriented thin films - Chemical etching
4In2O3-1SnO2 as thin film surface coatings - Chemical etching
InGaAsP thin film layer grown by LPE - Chemical etching
InGaAsP as thin film layers - Chemical etching
InGaAsP epitaxy thin films - Chemical etching
Agua Regia - Ir thin films deposited on silicon (100), n-type - Chemical etching
Agua Regia - IrV and Ir80V20 thin films - Chemical etching
Fe thin films deposited by MBE on GaAs, (110) wafer substrates - Chemical etching
Fe thin films deposited by MBE on GaAs, (110) wafer - Polishing
FeO(x) thin films - Chemical etching
FeO(x) as thin film - Chemical cleaning
FePd (100) and crystalline thin films - Gas corrosion
PbI2 as thin crystal platelets - Chemical etching
PbTe thin film - Acid float-off
LiN thin films - Chemical etching
LiInS2 (001) oriented thin films - Chemical etching
Mg3N4 thin films deposited on Mg specimen blanks - Chemical etching
Mn thin film deposits on ruthenium substrates - Chemical cleaning
Mn thin films - Chemical polishing/etching
Hg applied as a thin film - Chemical etching
HgCdTe (111) thin films - Chemical etching
HgCdTe thin films - Chemical etching
Mo thin films and crystalline specimens - Metal alloying
Mo thin films - Chemical etching
Mo thin films and crystalline specimens - Chemical etching
Mo thin films and crystalline specimens - Chemical etching
MoN and Mo2N thin films grown on (100) silicon wafers - Chemical etching
MoO3 thin film - Chemical etching
Ni evaporated as an AuNi coating on resistors - Chemical etching
Ni evaporated thin films - Chemical etching
Ni thin film evaporation on glass - Chemical etching
Ni thin films - Chemical etching
Ni-Cr thin film deposition as a bimetallic layer of Au/Ni-Cr - Chemical etching
Agua Regia - Ni-Cr thin films evaporated on (111) and (100) oriented Si - Chemical etching
Ni-Cr evaporated thin films on (100) Si wafers - Chemical etching
Ni-Cr as an evaporated thin film on (100) oriented Si wafers - Chemical etching
Fe-Ni thin film - Chemical cleaning
NiO thin film platelets - Chemical etching
Nb thin films evaporated on glass - Gas oxidation
NbC thin films - Chemical etching
Nb3Ge thin films on (100) Ge substrates - Chemical etching
NbN (100) thin films deposited on NaCl - Ionized gas cleaning
Nb3Snorphous thin films - Heat, removal
Aqua Regia - Pd thin film - Chemical cleaning
Agua Regia, dilute - Pd thin films - Chemical cleaning
Aqua Regia - PdAu deposited as a 11 mixture on glass, quartz, and aapphire substrates - Chemical etching
Agua Regia - Pt and Au evaporated on silicon (111) - Chemical etching
Pt thin film - Acid, float-off
Pt thin films - Chemical etching
Pt-Pd thin films - Chemical etching
PtO crystalline thin films - Chemical etching
Se deposits remaining on the (TTT)B surface of HgSe wafers - Chemical etching
Se residual film left on CdSe polycrystalline thin films - Chemical etching
Se thin films - Acid, float-off
CrSi2 thin films deposited on silicon substrates - Gas oxidation
CoSi2 thin films grown on Si substrates-Ionized gas, removal
CoSi2 thin film grown on substrates of Si, (111) and (100) - Chemical etching
ErSi2 thin films grown on Si (100) - Thermal forming
FeWSi thin films deposited on silicon, (100) wafers - Chemical etching
MoSi2 thin films deposited on silicon substrates - Ionized gas etching
MoSi2 the films deposited on silicon substrates - Ionized gas etching
MoSi2 thin films - Gas forming
NiSi thin films deposited on silicon substrates - Ionized gas etching
NiSi2 thin films grown on silicon substrates - Chemical etching
NiSi2 thin films deposited on silicon wafers - Chemical cleaning
PdSi and PdSi2 thin films grown on silicon substrates - Chemical etching
PtSi thin films grown on silicon substrates - Chemical etching
Pt2Si thin films formed on silicon, (111) and (100) n-type wafers - Metal deposition
PtSi thin films deposited on silicon-Ionized gas etching
TaSi2 thin films deposited on silicon (100) - Chemical cleaning
TaSi2 thin films deposited on silicon substrates - Ionized gas etching
TaSi2 thin films deposited on silicon - Ionized gas etching
TaSi2 thin films - Chemical etching
TaSi2 thin films 2500-2800 A - Chemical etching
TaSi2 as thin films - Ionized gas etching
TaSi2 thin films - Chemical etching
TiSi2 thin film grown on Si substrates - Chemical etching
TiSi2 thin film formed on silicon (100) substrates - Chemical etching
TiSi2 thin films deposited on silicon wafers - Ionized gas etching
TiSi2 thin films grown on silicon substrates - Acid oxidation
TiSi thin films grown on (100) silicon wafers - Chemical etching
Agua Regia - Ti0.3W0.7Si2 thin films - Chemical polishing
WSi2 thin films grown on silicon substrates - Ionized gas etching
WSi2 thin films - Chemical etching
WSi2 thin films
VSi2 thin films
Si as poly-Si thin films - Chemical etching
Si poly-Si epitaxy deposited thin films - Chemical cleaning
a-Si-H thin film deposited on an a-SiO(x)N(y)H thin film - Chemical etching
a-Si-H thin films - Electrical defect
a-Si-H thin films grown on SiO2, Al2O3, and ZrO2 substrates - Chemical etching
Si as poly-Si thin film on silicon wafers - Ionizde gas structuring
BHF etchant - Si thin film epitaxy grown on (100) silicon wafer substrates
Si thin film deposition on germanium substrates - Chemical etching
SiC (0001) thin films grown on (100) silicon substrates - Chemical cleaning
a-SiC-H thin films deposited on Si (100) substrates - Chemical etching
a-SiC-H thin films deposited on Si (100) substrates - Chemical etching
Beta SiC thin films grown on Si, (100) wafers - Chemical etching
SiC thin films grown on Si (100) wafers - Gas doping
SiC epitaxy thin films - Molten flux, dislocation
SiC thin films vapor deposited on silicon wafers - Moletn flux etching
SiC thin films - Electrolytic etching
a-SiC-H thin films - Chemical etching
a-SiC-H thin films - Metal pinhole decoration
a-SiC-Horphous thin films - Ionized gas etching
a-SiC-Horphous thin films 500-3500 A thick - Chemical etching
Beta-SiC thin films grown on (100) silicon - Chemical cleaning
SiO2 thin film - Chemical etching
SiO2 thin film deposits on silicon wafer - Chemical etching
SiO2 thin films and native oxides - Chemical etching
SiO2 and Si3N4 thin films deposited on silicon - Chemical etching
SiO2 deposited as CVD thin films on (100) silicon substrates - Chemical etching
P etchant - SiO2 thin films deposited on (100) silicon wafers - Chemical etching
SiO2 thin films deposited on silicon wafers - Chemical etching
SiO2 thin films on Si (100) wafers - Chemical etching
BSG etchant - SiO22 as a BSG glassy layer on silicon - Chemical etching
SiO2 as thermal oxidation on silicon wafers - Chemical etching
SiO2 grown on IC devices - Chemical etching
SiO2 thin films on Si (100) wafers - Chemical etching
SiO2 thin films deposited on (100) silicon wafers - Chemical etching
SiO2 thin films deposited on silicon (100) - Chemical etching
SiO2 as thin film deposits - Chemical etching
SiO2 thin films deposited on (1OO) silicon wafers - Chemical etching
SiO2 thin films deposited on (111), p-type, 1-3 Ohm cm resistivity wafers - Chemical ecthing
SiO2 thin films deposited in etched grooves of (100) silicon wafers - Chemical etching
SiO2 thin films deposited on (100) silicon substrates - Dislocation etching
Pliskin's etchant - SiO2 thin films deposited on (100) silicon wafers - Chemical etching
DE-100 etchant - SiO2 thin films deposited by Silox system method on (100) silicon and GaAs-Cr (SI) wafers - Ionized gas etching
SiO2 thin film deposits - Ionized gas etching
SiO2 thin film coatings - Oxide, growth
SiO2 deposited on silicon wafer substrates
SiO2 thin films deposition on (100) silicon wafers - Oxide, growth
SiO2 thin films deposited by a special technique - Chemical etching
SiO2 deposition on aluminum and quartz blanks or silicon wafers - Chemical etching
SiO2 as a residual PSG surface film - Chemical etching
SiO2 thin film deposited on InP (100) wafer substrates - Chemical etching
SiO2 thin film deposits - Chemical etching
SiO2 thin film deposits - Chemical etching
SiO2 thin films deposited on silicon wafers
SiO2 thin film RF sputtered
BHF etchant - SiO2 thin films thermally evaporated - Chemical etching
SiO2 thin films deposited on silicon wafers - Chemical etching
SiO2 thin films on various substrates - Chemical cleaning
SiO2 thin film layers grown on silicon - Chemical etching
SiO2 thin film oxidation of silicon, (111) n-type wafers - Chemical etching
SiO2 thin film oxidation of silicon at 1200?C - Chemical etching
SiO2 thin films 160 nm thick - Chemical etching
Seeco's etchant - SiO2 thin films grown on silicon, (100), n-type substrates - Chemical etching
SiO2 thermally oxidized thin films on p-type (100) silicon wafers - Metal decoration
SiO2 thin films on silicon wafers as doped BPSG
SiO2 thin films RF sputtered 200-700 nm thick on (100) silicon wafers - Chemical etching
SiO2 thin films deposited on (100) silicon wafers - Metal decoration
SiO2 thin films deposited on (100) silicon wafers - Ionized gas etching
SiO2 thin films deposited on a variety of substrates/surfaces - Oxide, adhesive coat
SiO2 thin films deposited on silicon substrates - Chemical etching
SiO2 thin films deposited on silicon substrates - Chemical etching
SiO2 thin films RF sputter deposited in argon on (100) oriented silicon wafers - Chemical etching
SiO2 thin films grown on (100) silicon wafers - Ionized gas etching
SiO(x)N-H and Si-H thin films - Solvent cleaning
a-SiO2 thin films used as a diffusion mask on silicon wafers - Thermal conversion
SiO2 grown as a hydrated oxide on silicon wafers - Electrolytic oxidizing
SiO2 grown as a hydrated oxide on silicon wafers - Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers - Acid oxidation
SiO2 grown as a hydrated oxide on silicon wafers - Acid oxidation
SiO2 drawn for fiber optics and laser applications - Organic coating
W2O3(PO4)2 as anorphous glassy thin film - Chemical etching
LiInS2 thin films on (111) silicon wafer substrates - Chemical etching
BHF etchant - Si3N4 thin filmorphous deposits - Chemical etching
BHF etchant, modified - Si3N4 thin films - Chemical etching
Si and SiO(x)N(y) DC sputtered thin films on (111) silicon wafers - Chemical etching
Si3N4orphous thin films - Chemical ecthing
Si3N4 thin films deposited on silicon substrates - Chemical etching
Si3N4 and oxynitride thin films on silicon - Chemical etching
Si3N4 and oxynitride thin films on silicon - Chemical etching
Si3N4 thin films deposited by CVD on (100) silicon substrates - Chemical etching
Si3N4 thin films deposited by PECVD - Chemical etching
Si3N4 thin filmorphous deposits on silicon wafer substrates - Chemical etching
Si3N4 and oxynitrides deposits on (111) silicon - Chemical etching
Si3N4 and oxynitrides as DC sputtered thin film deposits on (111) silicon, n-type, 5-10 Ohm cm resistivity wafers - Chemical etching
Si3N4 and oxynitrides grown as thin films by DC sputtering on (111) silicon wafers - Chemical etching
BHF etchant, modified - Si3N4 and Si3NxOy thin films - Chemical etching
Si3N4 and oxynitride thin films - Chemical cleaning
Chrome regia etchant - Si3N4 oxynitrides and SiO2 thin films - Chemical cleaning
Si3N4, oxynitrides and SiO2 thin films - Chemical cleaning
Si3N4 oxynitrides and SiO2 DC/RF sputtered thin films - Chemical cleaning
Si3N4 thin films - Chemical cleaning
Si3N4 deposited as pyrolytic thin films - Chemical etching
Si3N4 thin films - Chemical etching
BHF etchant - NxSiO2 thin films - Chemical etching
a-Si3N4-H thin films - Ionized gas etching
BHF etchant - Si3N4 thin films RF plasma grown on silicon - Chemical etching
SiN(x) and SiO2 thin films - Ionized gas etching
SiN(x) and SiO2 thin films - Chemical ecthing
BHF etchant - Si3N4 thin films deposited on (100) silicon wafers - Chemical cleaning
a-SiN-H thin films deposited on (100) silicon and germanium wafers - Chemical etching
SiV2 thin films - Chemical etching/polishing
Ag thin films electroplated on brass - Chemical etching
Ag thin film deposits - Chemical cleaning/etching
Ag 100 a thick thin film - Chemical etching
Ag thin films - Chemical etching
Ag thin films - Chemical etching
Ag thin films - Chemical etching
Ag thin film coatings on Si, Al2O3 and ZrO2 substrates - Chemical etching
Ti-TiAg-Ag thin films - Chemical etching
Ag-Au evaporated thin films - Chemical etching
AgGaS2 thin films
SrF2 (100) thin film deposited on GaAs substrates - Chemical etching
SrF2 and Ba(x)Sr(1-x)F2 thin films and SrF2 (100) wafers - Chemical etching
Ta thin films - Chemical etching
Ta thin films converted to Ta2O5 and TaN - Chemical etching
TaH thin films grown on (100) - Electrolytic etching
TaC, electrolytic alloy deposited thin films on different substrates - Chemical etching
TaC, electrolytic alloy deposited thin films on different substrates - Chemical etching
TaN thin film deposits - Chemical polishing
ASTM etchant No. 161 - TaN thin films - Chemical etching
TaN thin films - Chemical etching
TaN thin films - Chemical etching
TaN thin films - Chemical etching
Ta2O3 thin films - Chemical etching
Ta2O5 thin films - Gas, stabilizing
TaW thin films-Solvent removal
Sn electroplated thin film - Chemical etching
Sn electroplated thin film - Chemical etching
SnO2 thin films - Chemical etching
SnO2 thin films deposited on SiO2 coated silicon wafer - Electrolytic etching
SnO2 thin films deposited on 1 mm glass slides - Chemical etching
SnO2 thin films deposited by CVD
SnTe thin films grown on muscovite mica (0001) substrates - Acid, float-off
SnTeorphous thin films - Chemical etching
Ti thin films - Chemical etching
Ti specimens and thin films - Chemical etching
Ti thin films - Chemical etching
Ti specimens and thin films - Chemical etching
Ti specimens and thin films - Chemical etching
Ti thin film deposit - Chemical etching
Ti thin film deposit - Chemical etching
Ti thin film evaporation in vacuum systems - Chemical etching
Ti evaporated as thin films - Chemical etching
AuTi thin films - Chemical thinning
TiC (100) thin films - Electrolytic polishing
TiO2 thin film deposited on GaAs (100) substrates - Chemical etching
Ti thin films - Electrolytic oxidation
TiO2 thin films deposited on GaAs (100) substrates - Ionized gas cleaning
TiO2 thin films deposited on (111), n-type silicon substrates - Chemical etching
TiO2 as a native oxide on titanium substrates - Chemical ecthing
TiO2 thin film deposits - Chemical etching
Ti2O3 specimens and thin films - Chemical etching
TiN thin films deposited on poly-Si - Chemical etching
TiN thin films deposited on poly - Si-Ionized gas etching
TiN thin films deposited on Ti (0001) substrates - Chemical etching
BHF etchant - TiN thin films - Chemical etching
TiN thin films deposited on silicon wafers - Chemical etching
TiN thin films deposited on (100) silicon wafers - Chemical etching
BHF etchant - TiN thin films deposited on poly-Si epitaxy layers - Chemical etching
TiW thin films - Chemical etching
RIE etchant - TiW thin films - Ionized gas etching
Agua Regia - TiW (1% Ti) thin films - Chemical etching
Agua Regia - Ti3W7Si2 thin films on silicon wafers, (111), (110) and (100) - Chemical etching
W thin films - Chemical etching
W thin film evaporated on silicon (100) substrates - Ionized gas etching
W thin films - Ionized gas etching
W thin films deposited by sputtering - Ionized gas entrapment
W thin film evaporation in vacuum systems - Chemical etching
W thin films - Chemical etching
W thin films - Chemical etching
WO3 thin film deposited on 2100 A SnO2 on a glass substrate - Chemical etching
WO(x) (x=3) thin film
a-WO3 thin films 499-8500 A thick - Chemical etching
VAl3 deposited on silicon, (001) substrates - Chemical cleaning/etching
CP4 etchant - ZnO thin film deposit - ZnO thin film deposit formed by oxidation of ZnSe
ZnSnP2 thin films grown on GaAs - Chemical etching
ZnSe thin films - Chemical cleaning/polishing
ZnTe thin films - Acid, float-off
ZnTe thin films - Chemical etching
Aqua Regia - ZnTe thin film deposits - Chemical etching
Zr thin film - Chemical etching
ZrO2 thin film deposits - Electrolytic polishing
ZrN thin films - Chemical cleaning
Agua Regia - a-Zr2Pd thin films - Chemical polishing/etching
Agua Regia - a-Zr3Rhorphous thin films - Chemical polishing/etching