Single Crystal Etchants

Single Crystal Etchants

68Ni-31.9Fe-0.1Mg and 63Ni-35Fe-2Mo single crystals - Wet (chemical) etching
79Ni-17Fe-4Mo Permalloy single crystal specimens - Chemical polishing
Ag single crystal specimens - Electrolytic polishing
Ag single crystal sphere - Gas etching
Ag single crystal sphere - Thermal forming
Ag single crystals - Wet (chemical) etching
Ag-Au single crystal alloy ingots - Wet (chemical) etching
Ag-Cd single crystal - 0.8 at.% Cd - Chemical thinning
Ag-I system - Beta-AgI single crystal
Ag-Mg single crystal - 0.8 at.% Mg
Ag-Sn (1%) single crystal alloys - Electrolytic polishing
Ag2Al single crystal specimens - Electrolytic polishing
Ag2Al single crystal sphere - Chemical polishing
Ag2Hg (110) single crystal - Chemical polishing/etching
Ag6Ge10P12 single crystal ingots - Wet (chemical) etching
AgCd single crystal specimens - Wet (chemical) etching
AgCl (100) bars, AgCl single crystal specimens - Wet (chemical) etching
AgCl single crystal oriented bars - Chemical cleaning
AgFeTe2 single crystal specimens - Chemical polishing
AgGaSe3 single crystals - Wet (chemical) etching
AgGaTe2 single crystals - Wet (chemical) etching
AgI single crystals - Chemical cleaning
AgInSe2 single crystals - Wet (chemical) etching
AgInTe2 single crystals - Wet (chemical) etching
AgMg single crystal specimens - Chemical cleaning
AgS single crystal whiskers - Wet (chemical) etching
AgS single crystal whiskers - Electrolytic polishing
AgSbTe2 single crystal specimens - Wet (chemical) etching
AgSbTe2 single crystal specimens - Chemical polishing
AgSbTe2 single crystal specimens - Dislocation etching
AgTiSe single crystal material - Chemical polishing
Agua Regia - SiO2 as single crystal natural quartz, artificial quartz, and vitreous silica (fused glass)
Agua Regia - Sn (100) single crystal - Wet (chemical) etching
Agua Regia - TiO2 single crystal natural rutile crystals - Chemical cleaning
Agua Regia - TlBiTe2 single crystal n-type - Chemical polishing/etching
Al material in growing AlGaAsP single crystals - Chemical cleaning
Al single crystal specimen - Physical etching
Al single crystal specimens - Electrolytic polishing
Al single crystal specimens - Electrolytic polishing
Al single crystal specimens - Electrolytic polishing
Al single crystal sphere - Gas oxidation
Al-Ag polycrystalline and single crystal ingots - Wet (chemical) etching
Al-Ag polycrystalline and single crystal ingots - Wet (chemical) etching
Al-Cu single crystal - Wet (chemical) etching
Al-Cu single crystal - Wet (chemical) etching
Al2O3 as natural single crystals - Chemical cleaning
Al2O3 as natural single crystals - Cleaning
Al2O3 single crystal - Vacuum, cleaning
Al2O3 single crystal sapphire - Dislocation etching
Al2O3 single crystal spheres - Thin film coating
Al2O3-Zr (1%) doped single crystal - Physical etching
AlNi2 single crystal - Wet (chemical) etching
AlP single crystal wafer - Chemical polishing
AlPO4 single crystal - Wet (chemical) etching
Alpha brass (Cu-Zn) single crystal - Electrolytic polishing, electro etching
Alpha-HgI2 single crystal specimens - Chemical polishing
Alpha-HgI2 single crystal specimens - Chemical polishing
Alpha-brass single crystals - Cutting
Alum, KAl(SO4)2 x 12H2O single crystals - Dislocation etching
Alumina (Al2O3) single crystal - Wet (chemical) etching
Alumina (Al2O3) single crystal - Wet (chemical) etching
Aluminium single crystal
Aluminium single crystal - Electrolytic polishing
Aluminium single crystal - Electrolytic polishing
Aluminium single crystal specimens - Chemical polishing
Aluminium single crystal specimens - Chemical polishing
Arsenic single crystal - Polishing and etching
As-Sb system (single crystal) - Etching for pit etch
Au (111) and (100) single crystal blanks - Wet (chemical) etching
Au as single crystal blanks - Abrasive polishing
Au single crystal spheres - Thermal forming
AuAg(x) single crystal ingots - Wet (chemical) etching
B etchant - Silicon - Wet (chemical) etching
B single crystal ingot
B single crystal ingot - Wet (chemical) etching
B2Te3 single crystal - Wet (chemical) etching
B4Ge3Ol2 single crystal - Chemical cleaning
BF3 etchant - Si single crystal spheres - Chemical ecthing
BP (100) and (111) single crystals - Molten flux
BP single crystal wafers - Electrolytic etching
BRM etchant - WS2 single crystal specimens - Chemical polishing
BRM etchant - WSe2 single crystal specimens - Chemical polishing
Ba2TiO3 single crystal - Thermal processing
BaWO4 single crystal - Chemical polishing
Barium fluoride single crystal (BaF2) - Wet (chemical) etching
Be single crystal - Electrolytic polishing
BeO (0001) single crystal wafers - Chemical ecthing
BeO (0001) single crystals - Mechanical, defect
Beryllia single crystals (BeO) - Dislocation etching
Beryllium - Dislocation etching
Beryllium oxide (BeO)-single crystal - Wet (chemical) etching
Beta-SiC (001) single crystal blanks - Ionized gas ecthing
Beta-SiC (001) single crystal blanks - Thermal cleaning
Bi single crystal - Wet (chemical) etching
Bi12GeO20 single crystal - Wet (chemical) etching
Bi12SiO20 single crystal - Wet (chemical) etching
Bi2Se3 single crystal ingot - Chemical polishing
BiSb single crystals Te doped - Dislocation etching
Bismuth-single crystal - Electrolytic polishing
Bismuth-single crystal - Etching for etch pits
Brass, as single crystal alpha-brass - Electrolytic polishing
C as graphite single crystal material - Stress, defect
C as single crystal graphite - Cleave
C as single crystal graphite specimens - Gas oxidation
C as single crystal graphite specimens - Metal decoration
CO2 single crystal - Cryogenic gas, forming
CP4 etchant - Si-Ge single crystal ingots - Wet (chemical) etching
Ca3Al2Ge3O12 single crystal ingot - Chemical cleaning
Ca5(PO4)1F-Nd single crystals - Wet (chemical) etching
Ca5(PO4)3F - Physical polishing
CaMoO4 single crystals
CaSiF2 single crystals - Wet (chemical) etching
CaW04 single crystal specimens - Chemical polishing
CaW04 single crystal specimens - Dislocation etching
CaWO4 single crystal specimens - Chemical polishing
CaWO4 single crystals - Pressure processing
Cadmium selenide (CdSe) hexagonal single crystal - Wet (chemical) etching
Cadmium selenide (CdSe) single crystal - Etch for (0001) facet
Cadmium single crystal - Wet (chemical) etching
Cadmium single crystal - Chemical polishing
Cadmium single crystal - Chemical polishing
Cadmium single crystal - Chemical-mechanical polishing
Cadmium sulphide (CdS) single crystal - Wet (chemical) etching
Cadmium sulphide (CdS) single crystals - Chemical polishing and etching
Cadmium sulphide (CdS) single crystals - Chemical polishing and etching
Cadmium telluride (CdTe) single crystal - Chemical polishing
Cd (111) and (100) single crystal wafers - Chemical polishing
Cd as single crystals and alloy specimens - Wet (chemical) etching
Cd dislocation free single crystals - Mechnical, defect
Cd single crystal specimens - Chemical thinning
Cd single crystal specimens - Physical etching
Cd single crystal wafer-Mechanical, orientation
Cd single crystals - Dislocation etching
Cd3As2 single crystal specimen - Chemical polishing
CdF2 single crystal ingots - Thermal, annealing
CdIn2Se4 single crystal specimens - Wet (chemical) etching
CdIn2Se4 single crystal specimens - Chemical polishing
CdS single crystal specimen - Chemical and thermal etching
CdTe single cystal ingot - Chemical cleaning
CeAl3 single crystal - Wet (chemical) etching
CeCu6 single crystal - Wet (chemical) etching
Cl2 single crystal - Pressure
Co oxide (CoO) single crystal - Wet (chemical) etching
Co oxide single crystal - Wet (chemical) etching
Co oxide single crystal - Wet (chemical) etching and electrolytic thinning
Co-Fe single crystal - Co-8 wt.% Fe
Co3S4 single crystal sphere - Wet (chemical) etching
Cobalt single crystal - Chemical polishing
Copper dislocation etchant - Si single crystal wafers of different orientations - Wet (chemical) etching
Copper single crystal - Wet (chemical) etching
Copper single crystal - Chemical polishing, electrolytic etching, etch pit etching
Copper single crystal - Electrolytic etching for etch pits
Copper single crystal - Electrolytic polishing
Copper single crystal - Etching for etch pits
Copper single crystals - Electrolytic polishing
Cr2O3 (111) single crystal - Material growth
CsCl single crystal - Wet (chemical) etching
Cu (111) single crystal - Chemical cleaning
Cu (1O0) single crystal wafers - Gas removal
Cu oxides-single crystals - Chemical polishing
Cu single crystal ingots - Wet (chemical) etching
Cu single crystal specimens - Acid cleaning
Cu single crystal specimens - Wet (chemical) etching
Cu single crystal specimens - Wet (chemical) etching
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Chemical polishing
Cu single crystal specimens - Electrolytic polishing
Cu single crystal specimens - Electrolytic polishing
Cu single crystal specimens - Electrolytic polishing
Cu single crystal specimens - Physical etching
Cu single crystal sphere - Acid oxidation
Cu single crystal sphere - Wet (chemical) etching
Cu single crystal sphere - Gas, preferential
Cu single crystal spheres - Electrolytic polishing
Cu single crystal spheres - Electrolytic oxide removal
Cu single crystal spheres - Salt, removal/preferential
Cu single crystal spheres - Acid oxidation
Cu single crystal spheres - Gas, preferential
Cu single crystal spheres - Thermal forming
Cu single crystal wafers - Wet (chemical) etching
Cu single crystal wafers - Wet (chemical) etching
Cu single crystals - Chemical cleaning
Cu single crystals - Deformation
Cu-Au single crystal (Cu3Au) - Electrolytic polishing
Cu-Fe single crystal - Up to 1.58 wt.% Fe
Cu-Ga sulphide (CuGeS2 single crystal) - Wet (chemical) etching
Cu-In-Se (CuInSe2) - Chemical polishing
Cu-In-Se (CuInSe2) - Chemical polishing
Cu-In-Se single crystals (CuInSe2) - Wet (chemical) etching - Aqua Regia
Cu3Au single crystal specimens - Electrolytic polishing
Cu3Au single crystal specimens - Electrolytic polishing
Cu6PS5-I single crystal - Wet (chemical) etching
CuBr single crystals - Chemical polishing
CuCl single crystals - Chemical polishing
CuGaS2 single crystals - Chemical cleaning
CuGaSe3 single crystal - Wet (chemical) etching
CuGaTe2 single crystals - Wet (chemical) etching
CuGe2P3 single crystal ingots - Wet (chemical) etching
CuI single crystals - Chemical polishing
CuInSe2 single crystal - Chemical polishing/staining
CuInTe2 single crystals - Wet (chemical) etching
CuNi single crystal specimens - Wet (chemical) etching
D (111) single crystal specimens - Thermal processing
Dy as single crystal spheres - Wet (chemical) etching
EDP etchant for single crystal silicon - Wet (chemical) etching
Er single crystal specimens - Thermal processing
Eu3Sc2Fe3OI2 single crystal
F (Fast) etchant - Silicon - Wet (chemical) etching
Fe single crystal and polycrystalline spheres - Thermal forming
Fe single crystal spheres - Wet (chemical) etching
Fe single crystal whiskers - Wet (chemical) etching
Fe single crystal whiskers - Thermal etching
Fe single crystal whiskers etched in this solution to observe dislocations
Fe single crystals - Wet (chemical) etching
Fe(3-x)Ti(x)O4 single crystal - Wet (chemical) etching
Fe, single crystal iron spheres - Wet (chemical) etching
Fe-Mn (1%) single crystal specimens - Wet (chemical) etching
Fe-Ni-Cr alloy - Fe-15Ni-15Cr-single crystal - Electrolytic polishing
Fe-Si (3%) single crystal specimens - Electrolytic polishing
Fe-Si single crystals - Chemical and elctrolytic etching
Fe2Al3Si3O12 as natural single crystal almandite - Chemical cleaning
Fe2Mo3O8 single crystals - Wet (chemical) etching
Fe2O3 natural single crystals - Wet (chemical) etching
Fe3O4 artificial single crystal magnetite - Cutting
Fe3O4 as fine natural single crystal - Chemical cleaning
Fe3O4 grown as a single crystal ingot - Chemical cleaning
Fe3O4 single crystal - Wet (chemical) etching
Fe3O4 single crystals - Wet (chemical) etching
Fe3O4 specimens - Wet (chemical) etching
FeAl single crystal specimens - Wet (chemical) etching
FeC single crystal alloys - Chemical thinning
FeS2 as artificial and natural single crystals - Pressure
FeS2 single crystal ingot - Chemical polishing
FeSi (7.7%) single crystal (100) - Thermal de-stress
Fluorine specimen
Ga as a constituent in single crystal GaAs p-type wafers - Wet (chemical) etching
Ga2O3 doped with iron and grown as single crystal ferrites - Wet (chemical) etching
GaAs single crystal spheres - Wet (chemical) etching
GaAs single crystal spheres - Wet (chemical) etching
GaFeO3 single crystal ingot - Acid, removal
GaN (0001) single crystal thin films - Electrolytic etching
GaP material used for growth of AlGaAsP single crystal ingots - Chemical cleaning
GaPO4 single crystals - Chemical ecthing
Gallium phosphide (GaP) single crystals - Wet (chemical) etching
Garnets as natural single crystals - Wet (chemical) etching
Gd single crystal specimens - Thermal etching
Ge as single crystal - Chemical polishing/etching
Ge as single crystal spheres - Chemical polishing
Ge as single crystal spheres - Molten flux etching
Ge single crystal - Acid, cover
Ge single crystal hemispheres - Wet (chemical) etching
Ge single crystal specimens
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal spheres - Wet (chemical) etching
Ge single crystal wire filaments - Electrolytic shaping
Ge single cyrstal spheres - Wet (chemical) etching
Ge specimens - Chemical oxidation
Ge spheres of single crystal germanium and silicon - Chemical polishing
GeS single crystal platelets - Chemical cleaning
GeTe single crystal specimens - Wet (chemical) etching
Gold single crystal - Electrolytic polishing
Gypsum single crystal - CaSo4 x 2H2O
Hafnium single crystal - Chemical polishing
Hf3Sn2 single crystal specimens - Wet (chemical) etching
Hg(1-x)Cd(x)Te single crystal - Chemical polishing
HgAg natural single crystal - Acid, removal
HgCdTe single crystal ingots and wafers - Wet (chemical) etching
HgCdTe single crystal material - Chemical polishing/etching
HgI2 single crystals - Ketone, growth
HgSe single crystal specimens - Chemical polishing
Ho single crystal specimens - Thermal etching
HoCu2Ge2 single crystal specimens - Wet (chemical) etching
In single crystal ingot - Wet (chemical) etching
In single crystal wires - Electrolytic etching
In2Tl3 single crystal ingots - Chemical polishing
In5Bi3 single crystal specimens - Chemical polishing
InSnO2 single crystal - Acid, flux, removal
Indium arsenide (InAs) - For etch pits
Indium arsenide (InAs) - For revealing the defect density
Indium phosphide arsenide (InP(x)As(1-x)) - Etching for etch pits
Indium single crystal - Wet (chemical) etching and polishing
KBr and KI single crystal specimens - Solvent polishing
KCl single crystal specimens - Acid forming
KCl single crystal specimens - Acid forming
KI and KBr single crystal specimens - Polishing
KMnFe3 single crystal sphere
KTaO3 iron doped single crystal wafer - Abrasive polishing
Kalling's etchant - Y2(CoM)17 single crystal ingots - Chemical polishing
Kr (100) solid single crystal ingots - Pressure
LaB single crystal filaments - Electrolytic polishing
LaB6 single crystal specimens - Acid, forming
LaCu6 single crystal - Wet (chemical) etching
LaSrCoO3 single crystals - Wet (chemical) etching
LaSrCoO3 single crystals cleaved (001) - Salt polishing
LaSrFeO3 single crystals - Wet (chemical) etching
Lead single crystal - Chemical polishing
Levenstein-Robinson's etchant - Silver single crystal - Chemical polishing and etching
Li single crystal spheres - Thermal forming
Li3Bi single crystal ingots - Chemical polishing
LiF (100) single crystal specimens - Wet (chemical) etching
LiF-MgF2 system - LiF-MgF2 eutectic
LiNbO3 single crystal specimens - Wet (chemical) etching
LiNbO3 single crystal specimens - Metal decoration
LiTaO3 single crystal specimens - Wet (chemical) etching
LiTaO3 single crystal wafers - Metal decoration
Lithium carbonate single crystal - Wet (chemical) etching
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - Chemical polishing
Lithium fluoride (LiF) - For etch pits etching
Lithium fluoride (LiF) - For etch pits etching
Lithium fluoride (LiF) single crystal - Wet (chemical) etching
Lithium fluoride (LiF) single crystal - Wet (chemical) etching
Lithium fluoride (LiF) single crystal - Wet (chemical) etching
Lithium tantalate (LiTa03) - For domain structure in single crystals
Livingstone's etchant, Young's etchant - Copper single crystal - Etching for etch pits
M" (Medium) etchant - Silicon - Wet (chemical) etching
Magnesia (MgO) single crystal - Wet (chemical) etching
Magnesia (MgO) single crystal - Wet (chemical) etching
Magnesia (MgO) single crystal - Wet (chemical) etching
Magnesia (MgO) single crystal - Chemical etrching
Magnesia (MgO) single crystal - Chemical polishing
Magnesia (MgO) single crystal - Chemical polishing and etching
Magnesium fluoride MgF2 - Chemical polishing
Magnesium fluoride MgF2 - For etching grains in hot pressed magnesium fluoride
Magnesium single crystal - Wet (chemical) etching
Mg single crystal specimens - Physical etching
Mg single crystal wafers - Wet (chemical) etching
Mg single crystal wafers - Electrolytic polishing
Mg2Si single crystals - Wet (chemical) etching
Mg2Sn single crystal specimens
MgO single crystal specimens - Electrolytic damage
MgS single crystals - Wet (chemical) etching
MgSe single crystal - Chemical polishing
MgTe single crystals - Wet (chemical) etching
Mn(x)Zn(1-x)Y(z)O12 single crystal specimens - Abrasive polishing
MnFe2 single crystal sphere - Abrasive, forming
MnO single crystals doped with iron as ferrites - Wet (chemical) etching
MnO2 single crystal specimens - Physical etching
MnTe2 single crystal specimens - Chemical polishing
Mo single crystal specimens - Electrolytic thinning
Mo-Nb alloy single crystal - Alloy with 5 at.% Nb
MoS2 natural single crystal specimens - Ester, removal
MoS2 single crystal platelets - Tape, cleaning
MoS2 single crystal specimens - Chemical polishing
MoSe2 single crystal specimens - Chemical polishing
MoSeS2 single crystal platelets - Tape, cleaning
MoTe2 single crystal specimens - Chemical polishing
Molybdenum selenide (MoSe2) - MoSe2 single crystal
Molybdenum single crystal - Electrolytic polishing
Moran's etchant - NaCl (100) wafers, NaCl single crystal whiskers - Wet (chemical) etching
N2, grown as a single crystal - Pressure, defect
NaBr single crystal specimens - Alcohol, cutting
NaCl (100) crystals
NaCl single crystal specimens - Wet (chemical) etching
NaNO3 single crystals - Base, removal
Nb (100) oriented single crystal cylinders - Thermal etching
Nb-Mo alloy - Single crystal alloys
Nb-Rh alloys single crystal - Chemical polishing
Nb-Sn alloys (single crystal Nb3Sn) - Wet (chemical) etching
Nb3Ge single crystal compound - Physical etching
Nb3Sn as single crystals - Chemical polishing
Nb3Te4 single crystal - Chemical cleaning
Ne grown as a single crystal - Pressure
Ni single crystal sphere - Thermal forming
Ni single crystals - Electrolytic thinning
NiAl single crystal specimens - Electrolytic polishing
NiCu (30%) single crystal - Thermal forming
NiI single crystal - Alcohol removal
NiMn single crystal specimens - Electrolytic etching
NiTi single crystal specimens - Wet (chemical) etching
Nickel single crystal - Electrolytic polishing
Niobium single crystal - Chemical polishing
Niobium single crystal - Electrolytic polishing
Niobium single crystal - Electrolytic polishing
Niobium single crystal - Produces triangular etch pits on (111) planes
OsS2 single crystal specimens - Chemical polishing
OsTe2 single crystal specimens - Chemical polishing
Pb single crystal ingots - Wet (chemical) etching
Pb single crystal specimens - Chemical polishing
Pb specimens and single crystal ingots - Wet (chemical) etching
PbGeTe single crystal ingots - Wet (chemical) etching
PbMoO4 single crystals - Pressure
PbO single crystal plates - Cutting
PbZrO3 single crystal specimens - Chemical polishing
PbZrO3 single crystal specimens - Chemical polishing
PbZrO3 single crystal specimens - Chemical polishing
Pd 99.95% pure single crystal specimens - Electrolytic polishing
Pd single crystals and thin films - Wet (chemical) etching
Picral etchant - Fe, single crystal iron whiskers - Dislocation etching
Potassium doped lithium carbonate single crystal - Li2O3-1% K2CO3
PrCo2Si2 single crystals - Wet (chemical) etching
Pt single crystal ingot - Halogen, pasivation
PtAs2 single crystal specimens - Chemical polishing
PtP2 single crystal specimens - Chemical polishing
PtSb2 single crystal specimens - Chemical polishing
R5In2 grown as single crystals - Wet (chemical) etching
Rb-Fe-F system (RbFeF3 single crystal) - Wet (chemical) etching
RuS2 single crystal specimens - Chemical polishing
RuSe2 single crystal specimens - Chemical polishing
RuTe2 single crystal specimens - Chemical polishing
Rutile single crystal (TiO2) - Chemical polishing
S (Slow) etchant - Silicon - Wet (chemical) etching
Sb single crystal wafers - Chemical polishing
Se single crystal specimens - Wet (chemical) etching
Se single crystal specimens - Wet (chemical) etching
Se single crystal specimens - Wet (chemical) etching
Si as a pre-cut single cystal octahedron, (111) form - Wet (chemical) etching
Si single crystal hemispheres - Wet (chemical) etching
Si single crystal spheres - Chemical ecthing
Si single crystal spheres - Wet (chemical) etching
Si single crystal spheres - Wet (chemical) etching
Si single crystal spheres - Wet (chemical) etching
Si single crystal spheres - Chemical polishing
Si single crystal spheres - Sample preparation
Si single crystal spheres - Si single crystal spheres
Si single crystal spheres 1/2" diameter - Chemical polishing
Si single crystal spheres From 1/8 to 1/2" in diameter - Sample preparation
Si single crystal spheres, p- and n-type - Sample preparation
Si single-crystal or poly-crystalline wafer - Wet (chemical) etching
SiC (0001) grown as alpha-II SiC - Abrasive polishing
SiC single crystal specimens - Electrolytic polishing
SiO2 (0001), (1010), natural single crystal and artificial fused quartz wafers and blank - Wet (chemical) etching
SiO2 as natural single crystal - Wet (chemical) etching
SiO2 as single crystal quartz blanks - Chemical cleaning
SiO2 single crystal artificial alpha-quartz blanks - Chemical thinning
SiO2 single crystal artificial specimens - Chemical cleaning
SiO2 single crystal blanks - Chemical cleaning
SiO2 single crystal blanks - Chemical cleaning
SiO2 single crystal blanks - Wet (chemical) etching
Silicon carbide (SiC) single crystal - For revealing the growth spirals
Silicon carbide (SiC) single crystal - Shows differences between Si (smooth etch) and C (rough etch) faces on opposing (001) surfaces
Silicon single crystals - Etching of the p-n transition
Silicon single crystals - For TEM sample preparation
Silicon single crystals - For TEM sample preparation
Silicon single crystals - For revealing dislocations
Silver single crystal - Chemical polishing
Silver single crystal - Chemical polishing
Silver single crystal - Chemical polishing and etching
Sn (001) and (111)-tetragonal alpha-tin single crystals - Electrolytic polishing
Sn single crystal ingots - Electrolytic sawing
Sn single crystal specimens - Physical etching
Sn single crystal sphere - Wet (chemical) etching
Sn single crystal wires - Electrolytic polishing
Sn white-tin single crystal - Chemical polishing
Sodium chloride (NaCl) - Chemical polishing of single crystal
Sodium fluoride (NaF) - Wet (chemical) etching
Sodium fluoride (NaF) - Wet (chemical) etching
Spinel single crystal (MgAl2O4) - For etching (100) face
SrGa12O19 single crystals - Wet (chemical) etching
SrTiO3 single crystal specimens - Abrasive polishing
SrTiO3 single crystal specimens - Abrasive polishing
SrWO4 single crystal specimens - Chemical polishing
Steel, (100) single crystal specimens - Chemical cleaning for plating
Strontium fluoride single crystal (SrF2) - Etch pits on (111) faces are revealed by etching
Strontium tetrahydrate - SrC4H4O6 x 4H2O single crystal
Strontium tetrahydrate - SrC4H4O6 x 4H2O single crystal
Strontium titanate (O-Sr-Ti) - Dislocation etch in single crystals
TaMo single crystal alloy - Electrolytic polishing
TaS2 single crystals - Wet (chemical) etching
TaSe2 single crystal specimens - Wet (chemical) etching
Tb single crystal specimens - Thermal etching
TeO2 as natural single crystals - Chemical polishing/etching
Tellurium single crystal - Wet (chemical) etching
Ti and Ti alloys (single crystals) - Dislocation etching
Ti-C system - TiC(x), 0.5 < x < 1.0 - Single crystal
TiB2 and TiC single crystal wafers - Cleaning
TiC single crystal ingot - Electrolytic polishing
TiO2 (110) natural single crystal rutile specimens - Salt flux decoration
TiO2 as natural single crystal rutile - Chemical cleaning
TiO2 as natural single crystal rutile - Gas cleaning
Tin (Sn) single crystal - Electrolytic polishing, Wet (chemical) etching
Titanium alpha-Ti single crystal - Chemical polishing
Titanium carbide (TiC) - Chemical and electrolytic etching
Titanium carbide (TiC) single crystal - Electrolytic polishing
Titanium diboride single crystals (B-Ti(2)) - Wet (chemical) etching
Tl2Se3 and TlSe single crystal - Chemical polishing
Tm single crystal specimens - Thermal etching
Tungsten single crystal - Electrolytic polishing
Tungsten single crystal - Electrolytic polishing, chemical polishing
UC single crystal wafers - Wet (chemical) etching
UTi single crystal specimens - Electrolytic polishing
V single crystal and polycrystalline spheres - Thermal forming
V-C system - VC(0.76) single crystals
VBr2 single crystals - Chemical polishing/etching
VC (1OO) single crystal and polyerystalline specimens - Wet (chemical) etching
VC (1OO) single crystal ingots - Electrolytic etching
VGa single crystal filaments - Wet (chemical) etching
Vanadium single crystal - Electrolytic polishing and etching
W single crystal wafers - Wet (chemical) etching
WC single crystal specimens - Thermal etching
WSe2 single crystal specimens - Solvent cleaning
Y single crystal specimens - Wet (chemical) etching
Y2Ga7O12 single crystals - Chemical cleaning
Y3Fe5O12 (YIG) single crystal - Chemical cleaning
Y3Fe5O12 (YIG) single crystal spheres - Abrasive polishing
Yb single crystal specimens - Wet (chemical) etching
Zinc - A cellular structure is shown in Zn single crystals by etching in this solution
Zinc oxide single crystal (ZnO) - Chemical polishing and etching
Zinc selenide (ZnSe) - Etchant for zinc selenide single crystals
Zinc single crystal - Sample preparation procedure
Zirconium diboride single crystals - Electrolytic thinning
Zn alloy single crystal platelets - Chemical polishing
Zn single crystal - Wet (chemical) etching
Zn single crystal specimens - Acid, cutting
Zn single crystal specimens - Dislocation etching
Zn single crystals - Chemical polishing
Zn3As2 single crystal sphere - Thermal etching
Zn3P2 single crystal and thin film - Wet (chemical) etching
ZnO single crystal material - Thermal treatment
ZnO single crystal specimens - ZnO single crystal specimens used in a study of deformation
ZnSe single crystal platelets - Wet (chemical) etching
ZnSe single crystal wafers - Wet (chemical) etching
ZnSiF2 single crystals - Wet (chemical) etching
ZnSnAs2 single crystals - Wet (chemical) etching
Zr single crystal
Zr2Ni single crystal specimen - Wet (chemical) etching
Zr2Ni single crystals - Wet (chemical) etching
ZrO2 single crystal specimen and ZrO2 thin film - Wet (chemical) etching
ZrO2 single crystal specimens - General etching
ZrS2 single crystal specimens - Sample etching
ZrV single crystal metallic alloy - Wet (chemical) etching