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Indium - Electrolytic polishing

Material Name: Indium
Recipe No.: 9930
Primary Chemical Element in Material: In
Sample Type: Bulk
Uses: Polishing
Etchant Name: None
Type (Macro/Micro): Micro
Etching Method: Electrolytic polishing
Etchant (Electrolyte) Composition: 50 ml HNO3, 20 ml HCl, 750 ml Carbitol.
Procedure (Condition): Current density: 0.3-0.6 A/cm2, voltage dc: 40-60 V, temperature: 20 C.
Note: Use for In and In-Tl alloys. For In, use Al cathode. Remove solid film with 10% HF. For In-Tl alloys, use at 100 C, austenitic stainless steel cathode. Use at 20 C for In. Guttman.
Reference: Vander Voort, Metallography Principles and Practice, McGraw-Hill, Inc., 1984, p. 574.